Inventor
ISHIZUKA KEITA
JP3 patents
Patents
3 patentsUS7879529B2Feb 1, 2011
Material for formation of resist protection film and method of forming resist pattern therewith
TOKYO OHKA KOGYO CO LTD37 citations91
US7846637B2Dec 7, 2010
Material for forming resist protective film for use in liquid immersion lithography process and method for forming resist pattern using the protective film
TOKYO OHKA KOGYO CO LTD40 citations91
US7951523B2May 31, 2011
Material for forming resist protective film and method for forming resist pattern using same
TOKYO OHKA KOGYO CO LTD2 citations61