Inventor
FUJII YASUSHI
JP45 patents
⚠️ This page may combine multiple inventors who share the name “FUJII YASUSHI”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
TOKYO OHKA KOGYO CO LTD
14 patentsUS6509279B2Jan 21, 2003
Methods for processing a coating film and for manufacturing a semiconductor element
TOKYO OHKA KOGYO CO LTD15 citations92
US9308715B2Apr 12, 2016
Laminate and method for separating the same
TOKYO OHKA KOGYO CO LTD10 citations84
US6664199B2Dec 16, 2003
Coating liquid for forming a silica group coating film having a small dielectric constant
TOKYO OHKA KOGYO CO LTD6 citations74
US6649534B2Nov 18, 2003
Methods for processing a coating film and for manufacturing a semiconductor element
TOKYO OHKA KOGYO CO LTD5 citations74
US10112377B2Oct 30, 2018
Supporting member separation method and supporting member separation apparatus
TOKYO OHKA KOGYO CO LTD6 citations73
US11111397B2Sep 7, 2021
Silica-based film-forming composition, method of producing substrate including silica-based film, and additive added to silica-based film-forming composition
TOKYO OHKA KOGYO CO LTD0 citations62
US7060361B2Jun 13, 2006
Silica-based organic film and method of manufacturing the same, and base material comprising organic film
TOKYO OHKA KOGYO CO LTD3 citations62
US6746963B2Jun 8, 2004
Method for processing coating film and method for manufacturing semiconductor element with use of the same method
TOKYO OHKA KOGYO CO LTD0 citations52
US7235500B2Jun 26, 2007
Material for forming silica based film
TOKYO OHKA KOGYO CO LTD1 citations51
US11236297B2Feb 1, 2022
Method of producing cell culture chip
TOKYO OHKA KOGYO CO LTD0 citations45
US10607876B2Mar 31, 2020
Method for processing mold material and method for manufacturing structural body
TOKYO OHKA KOGYO CO LTD0 citations41
US10364372B2Jul 30, 2019
Composition and method of producing siliceous film
TOKYO OHKA KOGYO CO LTD0 citations41
US9484238B2Nov 1, 2016
Attachment method
TOKYO OHKA KOGYO CO LTD0 citations41
US7785768B2Aug 31, 2010
Thermoacid generator for antireflection film formation, composition for antireflection film formation, and antireflection film made therefrom
TOKYO OHKA KOGYO CO LTD0 citations40
TOKYO ELECTRON LTD
9 patentsUS7482281B2Jan 27, 2009
Substrate processing method
TOKYO ELECTRON LTD14 citations84
US11551933B2Jan 10, 2023
Substrate processing method and substrate processing apparatus
TOKYO ELECTRON LTD0 citations63
US7902077B2Mar 8, 2011
Semiconductor device manufacturing method that recovers damage of the etching target while supplying a predetermined recovery gas
TOKYO ELECTRON LTD2 citations62
US10333062B2Jun 25, 2019
Substrate liquid processing method, substrate liquid processing apparatus, and storage medium
TOKYO ELECTRON LTD0 citations52
US11732357B2Aug 22, 2023
Substrate processing method and substrate processing apparatus
TOKYO ELECTRON LTD0 citations50
US10340176B2Jul 2, 2019
Substrate mounting method and substrate mounting device
TOKYO ELECTRON LTD0 citations49
US11499225B2Nov 15, 2022
Gas processing apparatus and gas processing method
TOKYO ELECTRON LTD0 citations47
US11248293B2Feb 15, 2022
Film-forming apparatus and film-forming method
TOKYO ELECTRON LTD0 citations46
US10864548B2Dec 15, 2020
Film forming method and film forming apparatus
TOKYO ELECTRON LTD0 citations40
NIPPON CATALYTIC CHEM IND
4 patentsUS5213665AMay 25, 1993
Process for producing 1-aminoanthraquinones
NIPPON CATALYTIC CHEM IND21 citations92
US5149848ASep 22, 1992
Process for producing 1-aminoanthraquinones
NIPPON CATALYTIC CHEM IND2 citations63
US4840749AJun 20, 1989
Process for production of 1-aminoanthraquinone
NIPPON CATALYTIC CHEM IND5 citations60
US5329026AJul 12, 1994
Process for preparation of 2-substituted 1,4-naphthoquinone
NIPPON CATALYTIC CHEM IND6 citations59