Inventor

MAES JAN WILLEM

BE92 patents

⚠️ This page may combine multiple inventors who share the name “MAES JAN WILLEM”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

MAES JAN WILLEM

ASM IP HOLDING BV

Semiconductor structure and device formed using selective epitaxial process

Sulfur-containing thin films

Semiconductor structure and device and methods of forming same using selective epitaxial process

Deposition of organic films

Method of forming a germanium oxynitride film

Source/drain performance through conformal solid state doping

Method of forming a structure on a substrate

Silane and borane treatments for titanium carbide films

Reaction chamber passivation and selective deposition of metallic films

Combined anneal and selective deposition process

Reaction chamber passivation and selective deposition of metallic films

Reaction chamber passivation and selective deposition of metallic films

Deposition of organic films

Selective deposition of aluminum and nitrogen containing material

Reaction chamber passivation and selective deposition of metallic films

Selective deposition of aluminum and nitrogen containing material

Selective passivation and selective deposition

Selective deposition of aluminum and nitrogen containing material

Selective deposition of aluminum and nitrogen containing material

Selective deposition of aluminum and nitrogen containing material

Cyclic aluminum nitride deposition in a batch reactor

Methods for selectively forming a target film on a substrate comprising a first dielectric surface and a second metallic surface

Method for forming metal chalcogenide thin films on a semiconductor device

Method of making a wire-based semiconductor device

Sulfur-containing thin films

Method for forming source/drain contact structure with chalcogen passivation

Methods for forming a semiconductor device and related semiconductor device structures

Method of making a resistive random access memory

Transition metal nitride deposition method

Methods for selectively forming a target film on a substrate comprising a first dielectric surface and a second metallic surface

Deposition of organic films

Method for forming an ultraviolet radiation responsive metal oxide-containing film

Method of forming a germanium oxynitride film

Sulfur-containing thin films

Metal selenide and metal telluride thin films for semiconductor device applications

Method of making a resistive random access memory device with metal-doped resistive switching layer

Method of making a wire-based semiconductor device

Selective deposition of SiOC thin films

Sequential infiltration synthesis apparatus and a method of forming a patterned structure

ASM INC

ALD of metal silicate films

Method of forming non-conformal layers

Remote plasma activated nitridation

ASM INT

Methods of depositing two or more layers on a substrate in situ

High stress nitride film and method for formation thereof

Dielectric layers and methods of forming the same

MACHKAOUTSAN VLADIMIR

Process for depositing electrode with high effective work function

VAN NOOTEN SEBASTIAN E

Method of forming non-conformal layers

ASM INT NV

Atomic layer deposition of antimony oxide films

PIERREUX DIETER

Method for adjusting the threshold voltage of a gate stack of a PMOS device

POMAREDE CHRISTOPHE

Multiple vapor sources for vapor deposition