Inventor
SHAMOUILIAN SHAMOUIL
US69 patents
Patents
50 patentsUS6280584B1Aug 28, 2001
Compliant bond structure for joining ceramic to metal
APPLIED MATERIALS INC167 citations99
US6108189AAug 22, 2000
Electrostatic chuck having improved gas conduits
APPLIED MATERIALS INC255 citations99
US6095084AAug 1, 2000
High density plasma process chamber
APPLIED MATERIALS INC250 citations99
US5996218ADec 7, 1999
Method of forming an electrostatic chuck suitable for magnetic flux processing
APPLIED MATERIALS INC160 citations99
US5880924AMar 9, 1999
Electrostatic chuck capable of rapidly dechucking a substrate
APPLIED MATERIALS INC159 citations99
US5745331AApr 28, 1998
Electrostatic chuck with conformal insulator film
APPLIED MATERIALS INC166 citations99
US5592358AJan 7, 1997
Electrostatic chuck for magnetic flux processing
APPLIED MATERIALS INC307 citations99
US5533923AJul 9, 1996
Chemical-mechanical polishing pad providing polishing unformity
APPLIED MATERIALS INC175 citations99
US6869880B2Mar 22, 2005
In situ application of etch back for improved deposition into high-aspect-ratio features
APPLIED MATERIALS INC241 citations98
US6863019B2Mar 8, 2005
Semiconductor device fabrication chamber cleaning method and apparatus with recirculation of cleaning gas
APPLIED MATERIALS INC608 citations98
US6755150B2Jun 29, 2004
Multi-core transformer plasma source
APPLIED MATERIALS INC79 citations98
US6721162B2Apr 13, 2004
Electrostatic chuck having composite dielectric layer and method of manufacture
APPLIED MATERIALS INC76 citations98
US6689252B1Feb 10, 2004
Abatement of hazardous gases in effluent
APPLIED MATERIALS INC80 citations98
US6503368B1Jan 7, 2003
Substrate support having bonded sections and method
APPLIED MATERIALS INC76 citations98
US6481886B1Nov 19, 2002
Apparatus for measuring pedestal and substrate temperature in a semiconductor wafer processing system
APPLIED MATERIALS INC92 citations98
US6320736B1Nov 20, 2001
Chuck having pressurized zones of heat transfer gas
APPLIED MATERIALS INC122 citations98
US6310755B1Oct 30, 2001
Electrostatic chuck having gas cavity and method
APPLIED MATERIALS INC325 citations98
US5820448AOct 13, 1998
Carrier head with a layer of conformable material for a chemical mechanical polishing system
APPLIED MATERIALS INC99 citations98
US6538872B1Mar 25, 2003
Electrostatic chuck having heater and method
APPLIED MATERIALS INC123 citations97
US6490146B2Dec 3, 2002
Electrostatic chuck bonded to base with a bond layer and method
APPLIED MATERIALS INC88 citations97
US6478924B1Nov 12, 2002
Plasma chamber support having dual electrodes
APPLIED MATERIALS INC124 citations97
US6418874B1Jul 16, 2002
Toroidal plasma source for plasma processing
APPLIED MATERIALS INC272 citations97
US6367412B1Apr 9, 2002
Porous ceramic liner for a plasma source
APPLIED MATERIALS INC135 citations97
US6185839B1Feb 13, 2001
Semiconductor process chamber having improved gas distributor
APPLIED MATERIALS INC83 citations97
US6094334AJul 25, 2000
Polymer chuck with heater and method of manufacture
APPLIED MATERIALS INC97 citations97
US6581275B2Jun 24, 2003
Fabricating an electrostatic chuck having plasma resistant gas conduits
APPLIED MATERIALS INC74 citations96
US6583980B1Jun 24, 2003
Substrate support tolerant to thermal expansion stresses
APPLIED MATERIALS INC60 citations96
US6490144B1Dec 3, 2002
Support for supporting a substrate in a process chamber
APPLIED MATERIALS INC57 citations96
US6462928B1Oct 8, 2002
Electrostatic chuck having improved electrical connector and method
APPLIED MATERIALS INC65 citations96
US6440221B2Aug 27, 2002
Process chamber having improved temperature control
APPLIED MATERIALS INC93 citations96
US6414834B1Jul 2, 2002
Dielectric covered electrostatic chuck
APPLIED MATERIALS INC56 citations96
US6391146B1May 21, 2002
Erosion resistant gas energizer
APPLIED MATERIALS INC73 citations96
US5883778AMar 16, 1999
Electrostatic chuck with fluid flow regulator
APPLIED MATERIALS INC68 citations96
US5753132AMay 19, 1998
Method of making electrostatic chuck with conformal insulator film
APPLIED MATERIALS INC78 citations96
US6730175B2May 4, 2004
Ceramic substrate support
APPLIED MATERIALS INC76 citations95
US6468490B1Oct 22, 2002
Abatement of fluorine gas from effluent
APPLIED MATERIALS INC78 citations95
US6151203ANov 21, 2000
Connectors for an electrostatic chuck and combination thereof
APPLIED MATERIALS INC76 citations95
US5986875ANov 16, 1999
Puncture resistant electrostatic chuck
APPLIED MATERIALS INC42 citations95
US5729423AMar 17, 1998
Puncture resistant electrostatic chuck
APPLIED MATERIALS INC57 citations95
US5486975AJan 23, 1996
Corrosion resistant electrostatic chuck
APPLIED MATERIALS INC116 citations95
US6557248B1May 6, 2003
Method of fabricating an electrostatic chuck
APPLIED MATERIALS INC47 citations94
US6494958B1Dec 17, 2002
Plasma chamber support with coupled electrode
APPLIED MATERIALS INC74 citations94
US6023405AFeb 8, 2000
Electrostatic chuck with improved erosion resistance
APPLIED MATERIALS INC56 citations94
US5822171AOct 13, 1998
Electrostatic chuck with improved erosion resistance
APPLIED MATERIALS INC74 citations94
US7363876B2Apr 29, 2008
Multi-core transformer plasma source
APPLIED MATERIALS INC37 citations93
US6682627B2Jan 27, 2004
Process chamber having a corrosion-resistant wall and method
APPLIED MATERIALS INC37 citations93
US6639783B1Oct 28, 2003
Multi-layer ceramic electrostatic chuck with integrated channel
APPLIED MATERIALS INC46 citations93
US6267839B1Jul 31, 2001
Electrostatic chuck with improved RF power distribution
APPLIED MATERIALS INC44 citations93
US6217655B1Apr 17, 2001
Stand-off pad for supporting a wafer on a substrate support chuck
APPLIED MATERIALS INC23 citations93
US6055150AApr 25, 2000
Multi-electrode electrostatic chuck having fuses in hollow cavities
APPLIED MATERIALS INC101 citations93
Showing the top 50 of 69 patents by PatentIndex Score.