P

Inventor

KUMAR ANANDA H

US80 patents
⚠️ This page may combine multiple inventors who share the name “KUMAR ANANDA H”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

APPLIED MATERIALS INC

23 patents
US6280584B1Aug 28, 2001

Compliant bond structure for joining ceramic to metal

APPLIED MATERIALS INC167 citations99
US6108189AAug 22, 2000

Electrostatic chuck having improved gas conduits

APPLIED MATERIALS INC255 citations99
US6095084AAug 1, 2000

High density plasma process chamber

APPLIED MATERIALS INC250 citations99
US5880924AMar 9, 1999

Electrostatic chuck capable of rapidly dechucking a substrate

APPLIED MATERIALS INC159 citations99
US6721162B2Apr 13, 2004

Electrostatic chuck having composite dielectric layer and method of manufacture

APPLIED MATERIALS INC76 citations98
US6586886B1Jul 1, 2003

Gas distribution plate electrode for a plasma reactor

APPLIED MATERIALS INC115 citations98
US6310755B1Oct 30, 2001

Electrostatic chuck having gas cavity and method

APPLIED MATERIALS INC325 citations98
US6538872B1Mar 25, 2003

Electrostatic chuck having heater and method

APPLIED MATERIALS INC123 citations97
US6490146B2Dec 3, 2002

Electrostatic chuck bonded to base with a bond layer and method

APPLIED MATERIALS INC88 citations97
US6490144B1Dec 3, 2002

Support for supporting a substrate in a process chamber

APPLIED MATERIALS INC57 citations96
US6462928B1Oct 8, 2002

Electrostatic chuck having improved electrical connector and method

APPLIED MATERIALS INC65 citations96
US6440221B2Aug 27, 2002

Process chamber having improved temperature control

APPLIED MATERIALS INC93 citations96
US6414834B1Jul 2, 2002

Dielectric covered electrostatic chuck

APPLIED MATERIALS INC56 citations96
US6682627B2Jan 27, 2004

Process chamber having a corrosion-resistant wall and method

APPLIED MATERIALS INC37 citations93
US6639783B1Oct 28, 2003

Multi-layer ceramic electrostatic chuck with integrated channel

APPLIED MATERIALS INC46 citations93
US6267839B1Jul 31, 2001

Electrostatic chuck with improved RF power distribution

APPLIED MATERIALS INC44 citations93
US6217655B1Apr 17, 2001

Stand-off pad for supporting a wafer on a substrate support chuck

APPLIED MATERIALS INC23 citations93
US5751537AMay 12, 1998

Multielectrode electrostatic chuck with fuses

APPLIED MATERIALS INC43 citations93
US6677712B2Jan 13, 2004

Gas distribution plate electrode for a plasma receptor

APPLIED MATERIALS INC22 citations92
US6273958B2Aug 14, 2001

Substrate support for plasma processing

APPLIED MATERIALS INC20 citations92
US6220607B1Apr 24, 2001

Thermally conductive conformal media

APPLIED MATERIALS INC30 citations92
US6370006B1Apr 9, 2002

Electrostatic chuck having a plurality of gas inlet channels

APPLIED MATERIALS INC19 citations88
US7670688B2Mar 2, 2010

Erosion-resistant components for plasma process chambers

APPLIED MATERIALS INC15 citations84

IBM

9 patents

MICROFABRICA INC

6 patents

UNIV SOUTHERN CALIFORNIA

4 patents

KUMAR ANANDA H

3 patents

SARNOFF DAVID RES CENTER

2 patents

(unassigned)

1 patent

WU MING TING

1 patent

COHEN ADAM L

1 patent

Showing the top 50 of 80 patents by PatentIndex Score.