Inventor

KHOLODENKO ARNOLD

US53 patents

⚠️ This page may combine multiple inventors who share the name “KHOLODENKO ARNOLD”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

KHOLODENKO ARNOLD

APPLIED MATERIALS INC

Electrostatic chuck having improved gas conduits

High density plasma process chamber

Electrostatic chuck having composite dielectric layer and method of manufacture

Substrate support having bonded sections and method

Chuck having pressurized zones of heat transfer gas

Electrostatic chuck having gas cavity and method

Plasma reactor having a helicon wave high density plasma source

Wafer support with improved temperature control

Plasma process chamber

Electrostatic chuck having heater and method

Electrostatic chuck bonded to base with a bond layer and method

Plasma chamber support having dual electrodes

Substrate support member for a processing chamber

Semiconductor process chamber having improved gas distributor

Polymer chuck with heater and method of manufacture

Temperature control system for semiconductor process chamber

Substrate support tolerant to thermal expansion stresses

Electrostatic chuck having improved electrical connector and method

Dielectric covered electrostatic chuck

Self-cleaning focus ring

Magnetically enhanced inductively coupled plasma reactor with magnetically confined plasma

Substrate support member

Connectors for an electrostatic chuck and combination thereof

Method and apparatus for encapsulation of an edge of a substrate during an electro-chemical deposition process

Electrostatic chuck with improved RF power distribution

Semiconductor process chamber having improved gas distributor

Topographical structure of an electrostatic chuck and method of fabricating same

Electrostatic chuck having a unidirectionally conducting coupler layer

Electrostatic chuck with improved temperature control and puncture resistance

Backside gas quick dump apparatus for a semiconductor wafer processing system

Method of fabricating a semiconductor wafer support chuck apparatus having small diameter gas distribution ports for distributing a heat transfer gas

KHOLODENKO ARNOLD

Wafer carrier drive apparatus and method for operating the same

Multi-stage substrate cleaning method and apparatus

Multi-stage substrate cleaning method and apparatus

Plasma processing chamber with a grounded electrode assembly

Single substrate processing head for particle removal using low viscosity fluid

Method for using generator for foam to clean substrate

Apparatus for substantially uniform fluid flow rates relative to a proximity head in processing of a wafer surface by a meniscus

Generator for foam to clean substrate

LAM RES CORP

Apparatus for an optimized plasma chamber grounded electrode assembly

Plasma processing chamber with a grounded electrode assembly

High power electrical connector for a laminated heater

Proximity head having a fluid resistor

ROTOFLEX INC

Resilient rotary seal with projecting edge

Rotary shaft sealing method and device

CHENG WING LAU

Hybrid composite wafer carrier for wet clean equipment

Method for manufacturing a hybrid composite wafer carrier for wet clean equipment

O'DONNELL ROBERT

System, method and apparatus for maintaining separation of liquids in a controlled meniscus

System, method and apparatus for maintaining separation of liquids in a controlled meniscus

(unassigned)

Apparatus for regulating temperature of a process kit in a semiconductor wafer-processing chamber