Inventor
GUTHRIE WILLIAM L
US22 patents
⚠️ This page may combine multiple inventors who share the name “GUTHRIE WILLIAM L”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
APPLIED MATERIALS INC
11 patentsUS6280290B1Aug 28, 2001
Method of forming a transparent window in a polishing pad
APPLIED MATERIALS INC165 citations99
US6045439AApr 4, 2000
Forming a transparent window in a polishing pad for a chemical mechanical polishing apparatus
APPLIED MATERIALS INC228 citations99
US5893796AApr 13, 1999
Forming a transparent window in a polishing pad for a chemical mechanical polishing apparatus
APPLIED MATERIALS INC739 citations99
US5795215AAug 18, 1998
Method and apparatus for using a retaining ring to control the edge effect
APPLIED MATERIALS INC243 citations98
US6910944B2Jun 28, 2005
Method of forming a transparent window in a polishing pad
APPLIED MATERIALS INC28 citations96
US5709593AJan 20, 1998
Apparatus and method for distribution of slurry in a chemical mechanical polishing system
APPLIED MATERIALS INC188 citations96
US7255629B2Aug 14, 2007
Polishing assembly with a window
APPLIED MATERIALS INC24 citations92
US7118450B2Oct 10, 2006
Polishing pad with window and method of fabricating a window in a polishing pad
APPLIED MATERIALS INC19 citations92
US7011565B2Mar 14, 2006
Forming a transparent window in a polishing pad for a chemical mechanical polishing apparatus
APPLIED MATERIALS INC22 citations92
US6280297B1Aug 28, 2001
Apparatus and method for distribution of slurry in a chemical mechanical polishing system
APPLIED MATERIALS INC24 citations92
US6051499AApr 18, 2000
Apparatus and method for distribution of slurry in a chemical mechanical polishing system
APPLIED MATERIALS INC28 citations92
IBM
7 patentsUS4954142ASep 4, 1990
Method of chemical-mechanical polishing an electronic component substrate and polishing slurry therefor
IBM330 citations98
US5337015AAug 9, 1994
In-situ endpoint detection method and apparatus for chemical-mechanical polishing using low amplitude input voltage
IBM171 citations97
US4944836AJul 31, 1990
Chem-mech polishing method for producing coplanar metal/insulator films on a substrate
IBM539 citations97
US4789648ADec 6, 1988
Method for producing coplanar multi-level metal/insulator films on a substrate and for forming patterned conductive lines simultaneously with stud vias
IBM526 citations97
US6020264AFeb 1, 2000
Method and apparatus for in-line oxide thickness determination in chemical-mechanical polishing
IBM141 citations95
US4702792AOct 27, 1987
Method of forming fine conductive lines, patterns and connectors
IBM120 citations95
US5633195AMay 27, 1997
Laser planarization of zone 1 deposited metal films for submicron metal interconnects
IBM12 citations74