P

Inventor

SUGIURA MASAHITO

JP25 patents
⚠️ This page may combine multiple inventors who share the name “SUGIURA MASAHITO”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

TOKYO ELECTRON LTD

16 patents
US6143081ANov 7, 2000

Film forming apparatus and method, and film modifying apparatus and method

TOKYO ELECTRON LTD186 citations99
US6126753AOct 3, 2000

Single-substrate-processing CVD apparatus and method

TOKYO ELECTRON LTD180 citations99
US6232248B1May 15, 2001

Single-substrate-heat-processing method for performing reformation and crystallization

TOKYO ELECTRON LTD84 citations98
US6467491B1Oct 22, 2002

Processing apparatus and processing method

TOKYO ELECTRON LTD97 citations96
US6428850B1Aug 6, 2002

Single-substrate-processing CVD method of forming film containing metal element

TOKYO ELECTRON LTD71 citations96
US10041174B2Aug 7, 2018

Method for forming carbon nanotubes and carbon nanotube film forming apparatus

TOKYO ELECTRON LTD39 citations93
US9059178B2Jun 16, 2015

Method for forming carbon nanotubes and carbon nanotube film forming apparatus

TOKYO ELECTRON LTD36 citations93
US7037560B1May 2, 2006

Film forming method, and film modifying method

TOKYO ELECTRON LTD26 citations92
US6800546B2Oct 5, 2004

Film forming method by radiating a plasma on a surface of a low dielectric constant film

TOKYO ELECTRON LTD20 citations92
US11972929B2Apr 30, 2024

Processing apparatus and film forming method

TOKYO ELECTRON LTD2 citations72
US12456620B2Oct 28, 2025

Film-forming method

TOKYO ELECTRON LTD0 citations62
US12018375B2Jun 25, 2024

Flim forming method of carbon-containing film by microwave plasma

TOKYO ELECTRON LTD0 citations62
US12014907B2Jun 18, 2024

Method and device for forming graphene structure

TOKYO ELECTRON LTD0 citations62
US11302576B2Apr 12, 2022

Method of making a semiconductor device including a graphene barrier layer between conductive layers

TOKYO ELECTRON LTD0 citations62
US12534800B2Jan 27, 2026

Pre-coating method and processing apparatus

TOKYO ELECTRON LTD0 citations51
US6890848B2May 10, 2005

Fabrication process of a semiconductor device

TOKYO ELECTRON LTD0 citations46

IBM

2 patents

NIPPON DENSO CO

1 patent

NEC CORP

1 patent

KAJIKAWA MASUNORI

1 patent

KINO KOICHI

1 patent

SUGIURA MASAHITO

1 patent

MICROBIAL CHEM RES FOUND

1 patent

DENSO CORP

1 patent