Inventor
AUTH CHRISTOPHER P
US65 patents
Patents
50 patentsUS10121882B1Nov 6, 2018
Gate line plug structures for advanced integrated circuit structure fabrication
INTEL CORP56 citations99
US10121875B1Nov 6, 2018
Replacement gate structures for advanced integrated circuit structure fabrication
INTEL CORP61 citations98
US10304940B1May 28, 2019
Gate cut and fin trim isolation for advanced integrated circuit structure fabrication
INTEL CORP13 citations96
US6870179B2Mar 22, 2005
Increasing stress-enhanced drive current in a MOS transistor
INTEL CORP63 citations95
US10615265B2Apr 7, 2020
Gate cut and fin trim isolation for advanced integrated circuit structure fabrication
INTEL CORP8 citations93
US11031487B2Jun 8, 2021
Contact over active gate structures for advanced integrated circuit structure fabrication
INTEL CORP7 citations92
US10886383B2Jan 5, 2021
Replacement gate structures for advanced integrated circuit structure fabrication
INTEL CORP4 citations92
US10741669B2Aug 11, 2020
Differentiated voltage threshold metal gate structures for advanced integrated circuit structure fabrication
INTEL CORP10 citations92
US10541316B2Jan 21, 2020
Contact over active gate structures for advanced integrated circuit structure fabrication
INTEL CORP9 citations92
US10460993B2Oct 29, 2019
Fin cut and fin trim isolation for advanced integrated circuit structure fabrication
INTEL CORP6 citations92
US11063133B2Jul 13, 2021
Fin cut and fin trim isolation for advanced integrated circuit structure fabrication
INTEL CORP1 citations84
US11011616B2May 18, 2021
Gate line plug structures for advanced integrated circuit structure fabrication
INTEL CORP1 citations84
US10777656B2Sep 15, 2020
Fin cut and fin trim isolation for advanced integrated circuit structure fabrication
INTEL CORP3 citations84
US10756204B2Aug 25, 2020
Fin trim isolation with single gate spacing for advanced integrated circuit structure fabrication
INTEL CORP6 citations84
US10930753B2Feb 23, 2021
Trench isolation for advanced integrated circuit structure fabrication
INTEL CORP1 citations83
US10854732B2Dec 1, 2020
Dual metal gate structures for advanced integrated circuit structure fabrication
INTEL CORP1 citations83
US10840151B2Nov 17, 2020
Dual metal silicide structures for advanced integrated circuit structure fabrication
INTEL CORP5 citations83
US10790378B2Sep 29, 2020
Replacement gate structures for advanced integrated circuit structure fabrication
INTEL CORP3 citations83
US10727313B2Jul 28, 2020
Dual metal gate structures for advanced integrated circuit structure fabrication
INTEL CORP3 citations83
US10707133B2Jul 7, 2020
Trench plug hardmask for advanced integrated circuit structure fabrication
INTEL CORP5 citations83
US7338847B2Mar 4, 2008
Methods of manufacturing a stressed MOS transistor structure
INTEL CORP9 citations83
US11881520B2Jan 23, 2024
Fin patterning for advanced integrated circuit structure fabrication
INTEL CORP2 citations82
US11581419B2Feb 14, 2023
Heterogeneous metal line compositions for advanced integrated circuit structure fabrication
INTEL CORP2 citations82
US10854731B2Dec 1, 2020
Heterogeneous metal line compositions for advanced integrated circuit structure fabrication
INTEL CORP1 citations82
US10818774B2Oct 27, 2020
Plugs for interconnect lines for advanced integrated circuit structure fabrication
INTEL CORP1 citations82
US10777655B2Sep 15, 2020
Heterogeneous metal line compositions for advanced integrated circuit structure fabrication
INTEL CORP3 citations82
US10734379B2Aug 4, 2020
Fin end plug structures for advanced integrated circuit structure fabrication
INTEL CORP9 citations82
US11581420B2Feb 14, 2023
Contact over active gate structures for advanced integrated circuit structure fabrication
INTEL CORP2 citations81
US12199167B2Jan 14, 2025
Gate line plug structures for advanced integrated circuit structure fabrication
INTEL CORP0 citations73
US11646359B2May 9, 2023
Fin cut and fin trim isolation for advanced integrated circuit structure fabrication
INTEL CORP0 citations73
US11322601B2May 3, 2022
Gate cut and fin trim isolation for advanced integrated circuit structure fabrication
INTEL CORP1 citations73
US11955532B2Apr 9, 2024
Dual metal gate structure having portions of metal gate layers in contact with a gate dielectric
INTEL CORP0 citations72
US11887838B2Jan 30, 2024
Trench plug hardmask for advanced integrated circuit structure fabrication
INTEL CORP2 citations72
US11640985B2May 2, 2023
Trench isolation for advanced integrated circuit structure fabrication
INTEL CORP0 citations72
US11508626B2Nov 22, 2022
Dual metal silicide structures for advanced integrated circuit structure fabrication
INTEL CORP3 citations72
US11482611B2Oct 25, 2022
Replacement gate structures for advanced integrated circuit structure fabrication
INTEL CORP0 citations72
US11342445B2May 24, 2022
Differentiated voltage threshold metal gate structures for advanced integrated circuit structure fabrication
INTEL CORP0 citations72
US10943817B2Mar 9, 2021
Etch-stop layer topography for advanced integrated circuit structure fabrication
INTEL CORP3 citations72
US10796951B2Oct 6, 2020
Etch-stop layer topography for advanced integrated circuit structure fabrication
INTEL CORP3 citations72
US10796968B2Oct 6, 2020
Dual metal silicide structures for advanced integrated circuit structure fabrication
INTEL CORP3 citations72
US12538545B2Jan 27, 2026
Fin patterning for advanced integrated circuit structure fabrication
INTEL CORP0 citations71
US11404559B2Aug 2, 2022
Plugs for interconnect lines for advanced integrated circuit structure fabrication
INTEL CORP0 citations71
US11380683B2Jul 5, 2022
Fin end plug structures for advanced integrated circuit structure fabrication
INTEL CORP3 citations71
US10861850B2Dec 8, 2020
Fin end plug structures for advanced integrated circuit structure fabrication
INTEL CORP2 citations71
US12057492B2Aug 6, 2024
Gate cut and fin trim isolation for advanced integrated circuit structure fabrication
INTEL CORP0 citations63
US11799015B2Oct 24, 2023
Gate cut and fin trim isolation for advanced integrated circuit structure fabrication
INTEL CORP0 citations63
US10985267B2Apr 20, 2021
Fin trim isolation with single gate spacing for advanced integrated circuit structure fabrication
INTEL CORP1 citations63
US12426230B2Sep 23, 2025
Fin cut and fin trim isolation for advanced integrated circuit structure fabrication
INTEL CORP0 citations62
US12016170B2Jun 18, 2024
Fin cut and fin trim isolation for advanced integrated circuit structure fabrication
INTEL CORP0 citations62
US12349450B2Jul 1, 2025
Trench plug hardmask for advanced integrated circuit structure fabrication
INTEL CORP0 citations61
Showing the top 50 of 65 patents by PatentIndex Score.