Inventor
LEIDY ROBERT K
US95 patents
⚠️ This page may combine multiple inventors who share the name “LEIDY ROBERT K”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
IBM
44 patentsUS7781781B2Aug 24, 2010
CMOS imager array with recessed dielectric
IBM65 citations98
US7193289B2Mar 20, 2007
Damascene copper wiring image sensor
IBM89 citations98
US6184151B1Feb 6, 2001
Method for forming cornered images on a substrate and photomask formed thereby
IBM92 citations97
US6513796B2Feb 4, 2003
Wafer chuck having a removable insert
IBM76 citations96
US6344373B1Feb 5, 2002
Antifuse structure and process
IBM45 citations96
US5981148ANov 9, 1999
Method for forming sidewall spacers using frequency doubling hybrid resist and device formed thereby
IBM49 citations96
US5882967AMar 16, 1999
Process for buried diode formation in CMOS
IBM49 citations96
US5874778AFeb 23, 1999
Embedded power and ground plane structure
IBM73 citations96
US5811870ASep 22, 1998
Antifuse structure
IBM49 citations96
US6147394ANov 14, 2000
Method of photolithographically defining three regions with one mask step and self aligned isolation structure formed thereby
IBM54 citations95
US5959325ASep 28, 1999
Method for forming cornered images on a substrate and photomask formed thereby
IBM43 citations95
US6350548B1Feb 26, 2002
Nested overlay measurement target
IBM90 citations94
US7772028B2Aug 10, 2010
CMOS imager with Cu wiring and method of eliminating high reflectivity interfaces therefrom
IBM27 citations93
US7537951B2May 26, 2009
Image sensor including spatially different active and dark pixel interconnect patterns
IBM21 citations93
US7521798B2Apr 21, 2009
Stacked imager package
IBM13 citations93
US7361989B1Apr 22, 2008
Stacked imager package
IBM26 citations93
US7342268B2Mar 11, 2008
CMOS imager with Cu wiring and method of eliminating high reflectivity interfaces therefrom
IBM22 citations93
US6218704B1Apr 17, 2001
ESD protection structure and method
IBM52 citations93
US5939767AAug 17, 1999
Structure and process for buried diode formation in CMOS
IBM21 citations93
US6383719B1May 7, 2002
Process for enhanced lithographic imaging
IBM32 citations92
US6069040AMay 30, 2000
Fabricating a floating gate with field enhancement feature self-aligned to a groove
IBM26 citations92
US5976768ANov 2, 1999
Method for forming sidewall spacers using frequency doubling hybrid resist and device formed thereby
IBM31 citations92
US5972570AOct 26, 1999
Method of photolithographically defining three regions with one mask step and self aligned isolation structure formed thereby
IBM38 citations92
US5861330AJan 19, 1999
Method and structure to reduce latch-up using edge implants
IBM36 citations92
US5552718ASep 3, 1996
Electrical test structure and method for space and line measurement
IBM29 citations92
US5710460AJan 20, 1998
Structure for reducing microelectronic short circuits using spin-on glass as part of the interlayer dielectric
IBM24 citations91
US9874690B2Jan 23, 2018
Integrated waveguide structure with perforated chip edge seal
IBM15 citations84
US9240448B2Jan 19, 2016
Bipolar junction transistors with reduced base-collector junction capacitance
IBM5 citations84
US9093491B2Jul 28, 2015
Bipolar junction transistors with reduced base-collector junction capacitance
IBM7 citations84
US7928527B2Apr 19, 2011
Delamination and crack resistant image sensor structures and methods
IBM9 citations84
US7141836B1Nov 28, 2006
Pixel sensor having doped isolation structure sidewall
IBM14 citations84
US6420766B1Jul 16, 2002
Transistor having raised source and drain
IBM18 citations84
US6716559B2Apr 6, 2004
Method and system for determining overlay tolerance
IBM16 citations82
US5760483AJun 2, 1998
Method for improving visibility of alignment targets in semiconductor processing
IBM16 citations82
US6100013AAug 8, 2000
Method for forming transistors with raised source and drains and device formed thereby
IBM14 citations80
US7491561B2Feb 17, 2009
Pixel sensor having doped isolation structure sidewall
IBM7 citations74
US6815319B2Nov 9, 2004
Damascene resistor and method for measuring the width of same
IBM5 citations74
US6749969B2Jun 15, 2004
Reverse tone process for masks
IBM9 citations74
US6255178B1Jul 3, 2001
Method for forming transistors with raised source and drains and device formed thereby
IBM9 citations74
US6232639B1May 15, 2001
Method and structure to reduce latch-up using edge implants
IBM8 citations74
US6033949AMar 7, 2000
Method and structure to reduce latch-up using edge implants
IBM11 citations74
US6015750AJan 18, 2000
Method for improving visibility of alignment target in semiconductor processing
IBM5 citations74
US10476227B2Nov 12, 2019
Dual bond pad structure for photonics
IBM3 citations73
US9608403B2Mar 28, 2017
Dual bond pad structure for photonics
IBM2 citations73
ADKISSON JAMES W
2 patentsGLOBALFOUNDRIES INC
2 patentsGAMBINO JEFFREY P
1 patentINTERNAT BUSINESS MACHIENS COR
1 patentShowing the top 50 of 95 patents by PatentIndex Score.