Inventor
MACDONALD SCOTT A
US17 patents
⚠️ This page may combine multiple inventors who share the name “MACDONALD SCOTT A”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
IBM
14 patentsUS4657845AApr 14, 1987
Positive tone oxygen plasma developable photoresist
IBM120 citations96
US4552833ANov 12, 1985
Radiation sensitive and oxygen plasma developable resist
IBM105 citations96
US5545509AAug 13, 1996
Photoresist composition with photosensitive base generator
IBM63 citations95
US5312717AMay 17, 1994
Residue free vertical pattern transfer with top surface imaging resists
IBM78 citations95
US4908298AMar 13, 1990
Method of creating patterned multilayer films for use in production of semiconductor circuits and systems
IBM108 citations95
US6507456B1Jan 14, 2003
Dual coil and lead connections fabricated by image transfer and selective etch
IBM23 citations92
US5250395AOct 5, 1993
Process for imaging of photoresist including treatment of the photoresist with an organometallic compound
IBM34 citations92
US4810601AMar 7, 1989
Top imaged resists
IBM50 citations92
US5322765AJun 21, 1994
Dry developable photoresist compositions and method for use thereof
IBM47 citations91
US4551418ANov 5, 1985
Process for preparing negative relief images with cationic photopolymerization
IBM24 citations81
US4690838ASep 1, 1987
Process for enhancing the resistance of a resist image to reactive ion etching and to thermal flow
IBM12 citations73
US5432047AJul 11, 1995
Patterning process for bipolar optical storage medium
IBM9 citations71
US6821715B2Nov 23, 2004
Fully undercut resist systems using E-beam lithography for the fabrication of high resolution MR sensors
IBM4 citations62
US6482566B1Nov 19, 2002
Hydroxycarborane photoresists and process for using same in bilayer thin film imaging lithography
IBM3 citations62