Inventor

MCKEAN DENNIS R

US19 patents

⚠️ This page may combine multiple inventors who share the name “MCKEAN DENNIS R”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

MCKEAN DENNIS R

IBM

Process for imaging of photoresist including treatment of the photoresist with an organometallic compound

Process for patterned electroplating

Patterned electroplating

Positive resist compositions

Low temperature encapsulation system

O-quinone diazide sulfonic acid monoesters useful as sensitizers for positive resists

Process for making a thin film magnetic head

Deep ultra-violet lithographic resists with diazohomotetramic acid compounds

Di- and tricationic negative charge control agents for electrophotographic developers

HITACHI GLOBAL STORAGE NETHERL

Sliders bonded by a debondable encapsulant containing styrene and butadiene polymers

Sliders bonded by a debondable encapsulant comprising different polymers formed via in situ polymerization

Sliders bonded by a debondable encapsulant containing styrene and acrylate polymers

HITACHI GLOBAL STORAGE TECH

Slider processing system utilizing polyvinyl alcohol release layer

Segmented resist islands for photolithography on single sliders

HOECHST CELANESE CORP

Copolymers of 4-hydroxystyrene and alkyl substituted-4-hydroxystyrene in admixture with a photosensitizer to form a photosensitive composition

LABADIE JEFFREY W

Photosensitive polyamic alkyl ester composition and process for its use

CLARIANT FINANCE BVI LTD

Copolymers 4-hydroxystyrene and alkyl substituted-4-hydroxystyrene

HITACHI GLOBAL STORAGE TECH NL

Patterning a surface comprising silicon and carbon

HWANG CHERNGYE

Forming a planarized surface for at least one bar of sliders