Inventor

INAZAWA LEGAL REPRESENTATIVE R

JP2 patents

⚠️ This page may combine multiple inventors who share the name “INAZAWA LEGAL REPRESENTATIVE R”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

TOKYO ELECTRON LTD INC

1 patent

US7344993B2Mar 18, 2008

Low-pressure removal of photoresist and etch residue

TOKYO ELECTRON LTD INC39 citations88

TOSHIBA KK

1 patent

US7285498B2Oct 23, 2007

Etching method

TOSHIBA KK2 citations60