Inventor

NOZUE HIROSHI

JP22 patents

⚠️ This page may combine multiple inventors who share the name “NOZUE HIROSHI”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

NOZUE HIROSHI

NEC CORP

Charged-beam exposure mask and charged-beam exposure method

Electron beam cell projection lithography method for correcting coulomb interaction effects

Wafer stepper

Method for E-beam writing

Direct patterning method of resist film using electron beam

Photomask for semiconductor integrated circuit device

Exposing device capable of making clear pattern image on photo resist layer having different level surfaces

Semiconductor wafer for providing a plurality of semiconductor chips through electron-beam lithography

Optical aligner equipped with luminance sensor on movable stage

Method of manufacturing an EB mask for electron beam image drawing and device for manufacturing an EB mask

Method of aligning a semiconductor substrate with a base stage and apparatus for doing the same

Electron beam aperture structure and method for fabricating the same

Apparatus for exposing a semiconductor wafer to light including an illumination optical system comprising a glass substrate having light-permeable patterns

Method of manufacturing reticle

TOSHIBA KK

Memory management and protection system for virtual memory in computer system

Memory management and protection system for virtual memory in computer system

Apparatus and methods for implementing dedicated cache flushing

KUNIMATSU ATSUSHI

Information processing device including memory management device managing access from processor to memory and memory management method

TOSHIBA MEMORY CORP

Memory management device predicting an erase count

KURABE IND CO LTD

Cord type thermal fuse and sheet type thermal fuse

ABE TAKAYUKI

Pattern forming apparatus and pattern forming method

DAINIPPON PRINTING CO LTD

Transfer mask blank, transfer mask, and transfer method using the transfer mask