Inventor
NAM KEE SOO
KR25 patents
⚠️ This page may combine multiple inventors who share the name “NAM KEE SOO”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
KOREA ELECTRONICS TELECOMM
12 patentsUS6211018B1Apr 3, 2001
Method for fabricating high density trench gate type power device
KOREA ELECTRONICS TELECOMM131 citations98
US6087232AJul 11, 2000
Fabrication method of lateral double diffused MOS transistors
KOREA ELECTRONICS TELECOMM108 citations97
US5952704ASep 14, 1999
Inductor devices using substrate biasing technique
KOREA ELECTRONICS TELECOMM77 citations96
US6008097ADec 28, 1999
MOS transistor of semiconductor device and method of manufacturing the same
KOREA ELECTRONICS TELECOMM85 citations95
US5770509AJun 23, 1998
Method for forming an inductor devices using substrate biasing technique
KOREA ELECTRONICS TELECOMM23 citations93
US6534365B2Mar 18, 2003
Method of fabricating TDMOS device using self-align technique
KOREA ELECTRONICS TELECOMM24 citations92
US5733793AMar 31, 1998
Process formation of a thin film transistor
KOREA ELECTRONICS TELECOMM22 citations92
US5769679AJun 23, 1998
Method for manufacturing field emission display device
KOREA ELECTRONICS TELECOMM31 citations91
US5589083ADec 31, 1996
Method of manufacturing microstructure by the anisotropic etching and bonding of substrates
KOREA ELECTRONICS TELECOMM25 citations89
US5793096AAug 11, 1998
MOS transistor embedded inductor device using multi-layer metallization technology
KOREA ELECTRONICS TELECOMM17 citations84
US5711693AJan 27, 1998
Process for formation of large area flat panel display using side junction
KOREA ELECTRONICS TELECOMM16 citations73
US6040001AMar 21, 2000
Method of manufacturing a diamond vacuum device
KOREA ELECTRONICS TELECOMM0 citations41
S&S TECH CO LTD
11 patentsUS9256119B2Feb 9, 2016
Phase-shift blankmask and method for fabricating the same
S&S TECH CO LTD11 citations81
US10859901B2Dec 8, 2020
Pellicle for EUV lithography and method of fabricating the same
S&S TECH CO LTD10 citations80
US10768523B2Sep 8, 2020
Pellicle for EUV lithography and method of fabricating the same
S&S TECH CO LTD7 citations80
US9851632B2Dec 26, 2017
Phase-shift blankmask and photomask
S&S TECH CO LTD2 citations71
US9229317B2Jan 5, 2016
Blankmask and method for fabricating photomask using the same
S&S TECH CO LTD3 citations70
US10018905B2Jul 10, 2018
Phase shift blankmask and photomask
S&S TECH CO LTD0 citations50
US9389500B2Jul 12, 2016
Mask blank, photomask, and method for manufacturing same
S&S TECH CO LTD0 citations50
US8846276B2Sep 30, 2014
Blankmask and photomask using the same
S&S TECH CO LTD0 citations50
US9551925B2Jan 24, 2017
Blankmask and photomask using the same
S&S TECH CO LTD0 citations49
US10036947B2Jul 31, 2018
Blankmask and photomask using the same
S&S TECH CO LTD0 citations48
US9482940B2Nov 1, 2016
Blankmask and photomask
S&S TECH CO LTD0 citations48