P

Inventor

MARKOYA LOUIS

US9 patents
⚠️ This page may combine multiple inventors who share the name “MARKOYA LOUIS”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

ASML HOLDING NV

5 patents
US6967713B2Nov 22, 2005

Use of multiple reticles in lithographic printing tools

ASML HOLDING NV7 citations73
US7492442B2Feb 17, 2009

Adjustable resolution interferometric lithography system

ASML HOLDING NV6 citations72
US7474385B2Jan 6, 2009

Adjustable resolution interferometric lithography system

ASML HOLDING NV6 citations72
US7253879B2Aug 7, 2007

Liquid immersion lithography system with tilted liquid flow

ASML HOLDING NV6 citations72
US7751030B2Jul 6, 2010

Interferometric lithographic projection apparatus

ASML HOLDING NV5 citations58

SVG LITHOGRAPHY SYSTEMS INC

2 patents
US5966215AOct 12, 1999

Line width insensitive wafer target detection in two directions

SVG LITHOGRAPHY SYSTEMS INC14 citations71
US5920396AJul 6, 1999

Line width insensitive wafer target detection

SVG LITHOGRAPHY SYSTEMS INC5 citations71

(unassigned)

1 patent
US6628372B2Sep 30, 2003

Use of multiple reticles in lithographic printing tools

44 citations95

ASML NETHERLANDS BV

1 patent
US7499146B2Mar 3, 2009

Lithographic apparatus and device manufacturing method, an integrated circuit, a flat panel display, and a method of compensating for cupping

ASML NETHERLANDS BV4 citations62