Inventor
MOS EVERHARDUS C
NL2 patents
Patents
2 patentsUS6704089B2Mar 9, 2004
Lithographic projection apparatus, a method for determining a position of a substrate alignment mark, a device manufacturing method and device manufactured thereby
ASML NETHERLANDS BV20 citations87
US6987556B2Jan 17, 2006
Lithographic projection apparatus, a method for determining a position of a substrate alignment mark, a device manufacturing method and device manufactured thereby
ASML NETHERLANDS BV1 citations46