Inventor

DAI XUE CHUN

SG2 patents

Patents

2 patents

US6521539B1Feb 18, 2003

Selective etch method for selectively etching a multi-layer stack layer

CHARTERED SEMICONDUCTOR MFG17 citations80

US6877517B2Apr 12, 2005

Plasma etch method for forming plasma etched silicon layer

CHARTERED SEMICONDUCTOR MFG2 citations58