Inventor

PARK YOUNG-WOOK

KR66 patents

⚠️ This page may combine multiple inventors who share the name “PARK YOUNG-WOOK”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

PARK YOUNG-WOOK

SAMSUNG ELECTRONICS CO LTD

Methods of forming thin films by atomic layer deposition

Method of forming silicon containing thin films by atomic layer deposition utilizing trisdimethylaminosilane

Method of forming a thin film using atomic layer deposition

Method of forming thin film using atomic layer deposition method

Methods of forming integrated circuit capacitors having improved electrode and dielectric layer characteristics and capacitors formed thereby

Systems for forming films having high dielectric constants

One-cylinder stack capacitor and method for fabricating the same

Method for fabricating polysilicon film for semiconductor device

Apparatus for fabricating polysilicon film for semiconductor device

Method of making capacitor of highly integrated semiconductor device using multiple insulation layers

Method for interconnecting layers in semiconductor device

Method for forming a thin film

Method for manufacturing capacitor of semiconductor memory device having tantalum oxide film

Method for manufacturing capacitor of semiconductor device including thermal treatment to dielectric film under hydrogen atmosphere

Methods for forming capacitors including rapid thermal oxidation

High capacitance capacitor manufacturing method

Cryptographic apparatus for supporting multiple modes

Method of depositing film for semiconductor device in single wafer type apparatus using a lamp heating method

One-cylinder stack capacitor and method for fabricating the same

Methods of chemical vapor depositing ruthenium by varying chemical vapor deposition parameters

Plasma enhanced chemical vapor deposition methods of forming hemispherical grained silicon layers

Methods of fabricating microelectronic electrode structures using hemispherical grained (HSG) silicon

Methods for forming films having high dielectric constants

Method of manufacturing integrated circuit device

Methods and apparatus for forming thin films for semiconductor devices

Methods of fabricating integrated circuit devices providing improved short prevention

Semiconductor device having thin film formed by atomic layer deposition and method for fabricating the same

Methods for forming capacitors on semiconductor substrates

Methods of fabricating capacitors including Ta2O5 layers in a chamber including changing a Ta2O5 layer to heater separation or chamber pressure

Integrated circuit devices providing improved short prevention

Integrated circuit devices including a resistor pattern and methods for manufacturing the same

Methods of fabricating capacitors including Ta2O5 layers in a chamber including changing a Ta2O5 layer to heater separation or chamber pressure

Apparatus for forming a film on a substrate

Methods for forming capacitor structures including etching pits

Methods of forming capacitors including electrodes with hemispherical grained silicon layers on sidewalls thereof and related structures

Methods of forming hemispherical grained silicon (HSG-Si) capacitor structures including protective layers

Methods of forming capacitor electrodes containing HSG semiconductor layers therein

Methods of manufacturing semiconductor devices

Methods of fabricating a semiconductor substrate for reducing wafer warpage

Method of forming a contact structure having an anchoring portion

Methods of forming integrated circuit capacitors having doped HSG electrodes

Apparatus and manufacturing method for semiconductor device adopting NA interlayer contact structure

Method for cleaning a deposition chamber and deposition apparatus for performing in situ cleaning

Integrated circuit devices that utilize doped Poly-Si1−xGex conductive plugs as interconnects

Method for forming a multi-layered structure of a semiconductor device and methods for forming a capacitor and a gate insulation layer using the multi-layered structure

Method of manufacturing a semiconductor device including alignment mark

Manufacturing method of transistors

HYUNDAI MOTOR CO LTD

Front wheel suspension system for a vehicle

Multi-link rear suspension system

(unassigned)

Calibrated methods of forming hemispherical grained silicon layers