P

Inventor

MOUMEN NAIM

US39 patents
⚠️ This page may combine multiple inventors who share the name “MOUMEN NAIM”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

IBM

23 patents
US7741188B2Jun 22, 2010

Deep trench (DT) metal-insulator-metal (MIM) capacitor

IBM41 citations93
US7947549B2May 24, 2011

Gate effective-workfunction modification for CMOS

IBM7 citations84
US7863123B2Jan 4, 2011

Direct contact between high-κ/metal gate and wiring process flow

IBM8 citations84
US7754594B1Jul 13, 2010

Method for tuning the threshold voltage of a metal gate and high-k device

IBM17 citations84
US7682917B2Mar 23, 2010

Disposable metallic or semiconductor gate spacer

IBM11 citations84
US7498271B1Mar 3, 2009

Nitrogen based plasma process for metal gate MOS device

IBM10 citations84
US8053306B2Nov 8, 2011

PFET with tailored dielectric and related methods and integrated circuit

IBM8 citations83
US7691701B1Apr 6, 2010

Method of forming gate stack and structure thereof

IBM16 citations83
US7125782B2Oct 24, 2006

Air gaps between conductive lines for reduced RC delay of integrated circuits

IBM15 citations82
US6905976B2Jun 14, 2005

Structure and method of forming a notched gate field effect transistor

IBM9 citations73
US6987042B2Jan 17, 2006

Method of forming a collar using selective SiGe/Amorphous Si Etch

IBM7 citations71
US6617085B1Sep 9, 2003

Wet etch reduction of gate widths

IBM11 citations69
US7495743B2Feb 24, 2009

Immersion optical lithography system having protective optical coating

IBM2 citations63
US9412891B2Aug 9, 2016

Thermal receiver for high power solar concentrators and method of assembly

IBM2 citations62
US9324896B2Apr 26, 2016

Thermal receiver for high power solar concentrators and method of assembly

IBM2 citations62
US7129564B2Oct 31, 2006

Structure and method of forming a notched gate field effect transistor

IBM2 citations62
US7943453B2May 17, 2011

CMOS devices with different metals in gate electrodes using spin on low-k material as hard mask

IBM3 citations58
US8009268B2Aug 30, 2011

Immersion optical lithography system having protective optical coating

IBM0 citations52
US7646469B2Jan 12, 2010

Immersion optical lithography system having protective optical coating

IBM0 citations52
US6924205B2Aug 2, 2005

Collar formation using selective SiGe/Si etch

IBM1 citations52
US7915115B2Mar 29, 2011

Method for forming dual high-k metal gate using photoresist mask and structures thereof

IBM1 citations51
US10431705B2Oct 1, 2019

Cooling system for high performance solar concentrators

IBM0 citations47
US7741181B2Jun 22, 2010

Methods of forming mixed gate CMOS with single poly deposition

IBM0 citations47

GLOBALFOUNDRIES INC

3 patents

CHUDZIK MICHAEL P

3 patents

GUHA SUPRATIK

2 patents

BU HUIMING

2 patents

SEMATECH INC

1 patent

PARK DAE-GYU

1 patent

CARTIER EDUARD ALBERT

1 patent

ADKISSON JAMES WILLIAM

1 patent

ALABDULJABBAR AYMAN

1 patent

ALABDULJABBAR AYMAN A

1 patent