Inventor
MOUMEN NAIM
US39 patents
⚠️ This page may combine multiple inventors who share the name “MOUMEN NAIM”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
IBM
23 patentsUS7741188B2Jun 22, 2010
Deep trench (DT) metal-insulator-metal (MIM) capacitor
IBM41 citations93
US7947549B2May 24, 2011
Gate effective-workfunction modification for CMOS
IBM7 citations84
US7863123B2Jan 4, 2011
Direct contact between high-κ/metal gate and wiring process flow
IBM8 citations84
US7754594B1Jul 13, 2010
Method for tuning the threshold voltage of a metal gate and high-k device
IBM17 citations84
US7682917B2Mar 23, 2010
Disposable metallic or semiconductor gate spacer
IBM11 citations84
US7498271B1Mar 3, 2009
Nitrogen based plasma process for metal gate MOS device
IBM10 citations84
US8053306B2Nov 8, 2011
PFET with tailored dielectric and related methods and integrated circuit
IBM8 citations83
US7691701B1Apr 6, 2010
Method of forming gate stack and structure thereof
IBM16 citations83
US7125782B2Oct 24, 2006
Air gaps between conductive lines for reduced RC delay of integrated circuits
IBM15 citations82
US6905976B2Jun 14, 2005
Structure and method of forming a notched gate field effect transistor
IBM9 citations73
US6987042B2Jan 17, 2006
Method of forming a collar using selective SiGe/Amorphous Si Etch
IBM7 citations71
US6617085B1Sep 9, 2003
Wet etch reduction of gate widths
IBM11 citations69
US7495743B2Feb 24, 2009
Immersion optical lithography system having protective optical coating
IBM2 citations63
US9412891B2Aug 9, 2016
Thermal receiver for high power solar concentrators and method of assembly
IBM2 citations62
US9324896B2Apr 26, 2016
Thermal receiver for high power solar concentrators and method of assembly
IBM2 citations62
US7129564B2Oct 31, 2006
Structure and method of forming a notched gate field effect transistor
IBM2 citations62
US7943453B2May 17, 2011
CMOS devices with different metals in gate electrodes using spin on low-k material as hard mask
IBM3 citations58
US8009268B2Aug 30, 2011
Immersion optical lithography system having protective optical coating
IBM0 citations52
US7646469B2Jan 12, 2010
Immersion optical lithography system having protective optical coating
IBM0 citations52
US6924205B2Aug 2, 2005
Collar formation using selective SiGe/Si etch
IBM1 citations52
US7915115B2Mar 29, 2011
Method for forming dual high-k metal gate using photoresist mask and structures thereof
IBM1 citations51
US10431705B2Oct 1, 2019
Cooling system for high performance solar concentrators
IBM0 citations47
US7741181B2Jun 22, 2010
Methods of forming mixed gate CMOS with single poly deposition
IBM0 citations47
GLOBALFOUNDRIES INC
3 patentsUS9178036B1Nov 3, 2015
Methods of forming transistor devices with different threshold voltages and the resulting products
GLOBALFOUNDRIES INC45 citations94
US9461171B2Oct 4, 2016
Methods of increasing silicide to epi contact areas and the resulting devices
GLOBALFOUNDRIES INC4 citations73
US9564505B2Feb 7, 2017
Changing effective work function using ion implantation during dual work function metal gate integration
GLOBALFOUNDRIES INC4 citations72
CHUDZIK MICHAEL P
3 patentsUS8753936B2Jun 17, 2014
Changing effective work function using ion implantation during dual work function metal gate integration
CHUDZIK MICHAEL P4 citations72
US8120144B2Feb 21, 2012
Method for forming dual high-K metal gate using photoresist mask and structures thereof
CHUDZIK MICHAEL P2 citations62
US9236314B2Jan 12, 2016
High-K/metal gate stack using capping layer methods, IC and related transistors
CHUDZIK MICHAEL P0 citations42
GUHA SUPRATIK
2 patentsBU HUIMING
2 patentsUS8318565B2Nov 27, 2012
High-k dielectric gate structures resistant to oxide growth at the dielectric/silicon substrate interface and methods of manufacture thereof
BU HUIMING3 citations61
US8575709B2Nov 5, 2013
High-k dielectric gate structures resistant to oxide growth at the dielectric/silicon substrate interface and methods of manufacture thereof
BU HUIMING1 citations51