Inventor

TAKAGAKI HIROSHI

JP7 patents

Patents

7 patents

US6040112AMar 21, 2000

Photoresist composition

SUMITOMO CHEMICAL CO24 citations91

US5916728AJun 29, 1999

Positive resist composition

SUMITOMO CHEMICAL CO35 citations91

US5198323AMar 30, 1993

Resist composition containing alkali-soluble resin, 1,2-quinone diazide compound and anti-halation component

SUMITOMO CHEMICAL CO7 citations72

US5283324AFeb 1, 1994

Process for preparing radiation sensitive compound and positive resist composition

SUMITOMO CHEMICAL CO6 citations62

US5891601AApr 6, 1999

Positive resist composition

SUMITOMO CHEMICAL CO5 citations61

US5368987ANov 29, 1994

Process for producing resist composition

SUMITOMO CHEMICAL CO2 citations60

US5360696ANov 1, 1994

Resist composition

SUMITOMO CHEMICAL CO2 citations60