Inventor
NGUYEN KHANH B
US37 patents
⚠️ This page may combine multiple inventors who share the name “NGUYEN KHANH B”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
ADVANCED MICRO DEVICES INC
30 patentsUS6184128B1Feb 6, 2001
Method using a thin resist mask for dual damascene stop layer etch
ADVANCED MICRO DEVICES INC139 citations98
US6098408AAug 8, 2000
System for controlling reflection reticle temperature in microlithography
ADVANCED MICRO DEVICES INC111 citations98
US6020269AFeb 1, 2000
Ultra-thin resist and nitride/oxide hard mask for metal etch
ADVANCED MICRO DEVICES INC92 citations98
US6013399AJan 11, 2000
Reworkable EUV mask materials
ADVANCED MICRO DEVICES INC125 citations98
US6440640B1Aug 27, 2002
Thin resist with transition metal hard mask for via etch application
ADVANCED MICRO DEVICES INC53 citations96
US6309926B1Oct 30, 2001
Thin resist with nitride hard mask for gate etch application
ADVANCED MICRO DEVICES INC58 citations96
US6178221B1Jan 23, 2001
Lithography reflective mask
ADVANCED MICRO DEVICES INC62 citations96
US6165695ADec 26, 2000
Thin resist with amorphous silicon hard mask for via etch application
ADVANCED MICRO DEVICES INC57 citations96
US6159643ADec 12, 2000
Extreme ultraviolet lithography reflective mask
ADVANCED MICRO DEVICES INC52 citations96
US6306560B1Oct 23, 2001
Ultra-thin resist and SiON/oxide hard mask for metal etch
ADVANCED MICRO DEVICES INC34 citations93
US6200907B1Mar 13, 2001
Ultra-thin resist and barrier metal/oxide hard mask for metal etch
ADVANCED MICRO DEVICES INC46 citations93
US6171763B1Jan 9, 2001
Ultra-thin resist and oxide/nitride hard mask for metal etch
ADVANCED MICRO DEVICES INC38 citations93
US6162587ADec 19, 2000
Thin resist with transition metal hard mask for via etch application
ADVANCED MICRO DEVICES INC27 citations93
US6156658ADec 5, 2000
Ultra-thin resist and silicon/oxide hard mask for metal etch
ADVANCED MICRO DEVICES INC20 citations93
US6140023AOct 31, 2000
Method for transferring patterns created by lithography
ADVANCED MICRO DEVICES INC33 citations93
US6127070AOct 3, 2000
Thin resist with nitride hard mask for via etch application
ADVANCED MICRO DEVICES INC53 citations93
US6048652AApr 11, 2000
Backside polish EUV mask and method of manufacture
ADVANCED MICRO DEVICES INC55 citations93
US6414326B1Jul 2, 2002
Technique to separate dose-induced vs. focus-induced CD or linewidth variation
ADVANCED MICRO DEVICES INC21 citations92
US6057206AMay 2, 2000
Mark protection scheme with no masking
ADVANCED MICRO DEVICES INC36 citations92
US6271602B1Aug 7, 2001
Method for reducing the susceptibility to chemical-mechanical polishing damage of an alignment mark formed in a semiconductor substrate
ADVANCED MICRO DEVICES INC39 citations91
US6255125B1Jul 3, 2001
Method and apparatus for compensating for critical dimension variations in the production of a semiconductor wafer
ADVANCED MICRO DEVICES INC47 citations91
US6740566B2May 25, 2004
Ultra-thin resist shallow trench process using high selectivity nitride etch
ADVANCED MICRO DEVICES INC12 citations74
US6370680B1Apr 9, 2002
Device to determine line edge roughness effect on device performance
ADVANCED MICRO DEVICES INC12 citations74
US6208747B1Mar 27, 2001
Determination of scanning error in scanner by reticle rotation
ADVANCED MICRO DEVICES INC9 citations73
US6207966B1Mar 27, 2001
Mark protection with transparent film
ADVANCED MICRO DEVICES INC12 citations73
US5985498ANov 16, 1999
Method of characterizing linewidth errors in a scanning lithography system
ADVANCED MICRO DEVICES INC13 citations72
US6544885B1Apr 8, 2003
Polished hard mask process for conductor layer patterning
ADVANCED MICRO DEVICES INC6 citations63
US6326319B1Dec 4, 2001
Method for coating ultra-thin resist films
ADVANCED MICRO DEVICES INC4 citations62
US6178256B1Jan 23, 2001
Removal of reticle effect on critical dimension by reticle rotation
ADVANCED MICRO DEVICES INC3 citations61
US6316277B1Nov 13, 2001
Tuning substrate/resist contrast to maximize defect inspection sensitivity for ultra-thin resist in DUV lithography
ADVANCED MICRO DEVICES INC2 citations58