Inventor
NISHIYAMA MASAYA
JP6 patents
Patents
6 patentsUS6786945B2Sep 7, 2004
Polishing compound and method for polishing substrate
HITACHI CHEMICAL CO LTD83 citations96
US7070670B2Jul 4, 2006
Adhesive composition, method for preparing the same, adhesive film using the same, substrate for carrying semiconductor and semiconductor device
HITACHI CHEMICAL CO LTD46 citations91
US7374474B2May 20, 2008
Polishing pad for CMP, method for polishing substrate using it and method for producing polishing pad for CMP
HITACHI CHEMICAL CO LTD14 citations78
US9299573B2Mar 29, 2016
Polishing method
HITACHI CHEMICAL CO LTD4 citations70
US10946494B2Mar 16, 2021
Polishing agent, stock solution for polishing agent, and polishing method
HITACHI CHEMICAL CO LTD0 citations57
US10119049B2Nov 6, 2018
Polishing agent, storage solution for polishing agent and polishing method
HITACHI CHEMICAL CO LTD0 citations50