Inventor
DAUKSHER WILLIAM J
US20 patents
⚠️ This page may combine multiple inventors who share the name “DAUKSHER WILLIAM J”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
MOTOROLA INC
13 patentsUS6580172B2Jun 17, 2003
Lithographic template and method of formation and use
MOTOROLA INC214 citations98
US6387787B1May 14, 2002
Lithographic template and method of formation and use
MOTOROLA INC144 citations98
US6214122B1Apr 10, 2001
Rapid thermal processing susceptor
MOTOROLA INC492 citations98
US5464711ANov 7, 1995
Process for fabricating an X-ray absorbing mask
MOTOROLA INC39 citations92
US5899728AMay 4, 1999
Method of forming a lithographic mask
MOTOROLA INC24 citations91
US7163888B2Jan 16, 2007
Direct imprinting of etch barriers using step and flash imprint lithography
MOTOROLA INC15 citations79
US6368752B1Apr 9, 2002
Low stress hard mask formation method during refractory radiation mask fabrication
MOTOROLA INC9 citations73
US5266183ANov 30, 1993
Method for plating an x-ray mask
MOTOROLA INC4 citations62
US7425392B2Sep 16, 2008
Lithographic template and method of formation and use
MOTOROLA INC4 citations61
US7413924B2Aug 19, 2008
Plasma etch process for defining catalyst pads on nanoemissive displays
MOTOROLA INC4 citations60
US7125796B2Oct 24, 2006
Plasma etch process for multilayer vias having an organic layer with vertical sidewalls
MOTOROLA INC2 citations59
US6061137AMay 9, 2000
In-situ endpoint detection for membrane formation
MOTOROLA INC2 citations59
US6355384B1Mar 12, 2002
Mask, its method of formation, and a semiconductor device made thereby
MOTOROLA INC1 citations42
FREESCALE SEMICONDUCTOR INC
4 patentsUS7507638B2Mar 24, 2009
Ultra-thin die and method of fabricating same
FREESCALE SEMICONDUCTOR INC114 citations97
US7432024B2Oct 7, 2008
Lithographic template and method of formation and use
FREESCALE SEMICONDUCTOR INC6 citations72
US7083880B2Aug 1, 2006
Lithographic template and method of formation and use
FREESCALE SEMICONDUCTOR INC7 citations72
US6797440B2Sep 28, 2004
Method of forming a rim phase shifting mask and using the rim phase shifting mask to form a semiconductor device
FREESCALE SEMICONDUCTOR INC3 citations61