Inventor

KOZAWA MIWA

JP46 patents

⚠️ This page may combine multiple inventors who share the name “KOZAWA MIWA”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

KOZAWA MIWA

FUJITSU LTD

Resist cover film-forming material, process for forming resist pattern, semiconductor device and process for manufacturing the same

Silicon-containing polymer, process for its production, resist composition employing it, pattern-forming method and electronic device fabrication method

Negative resist composition, process for forming resist patterns, and process for manufacturing electron device

Silicon-containing polymer, process for its production, resist composition employing it, pattern-forming method and electronic device fabrication method

Resist pattern thickness reducing material, resist pattern and process for forming thereof, and semiconductor device and process for manufacturing thereof

Resist pattern thickening material, resist pattern and forming process thereof, and semiconductor device and manufacturing process thereof

Negative resist composition, method for the formation of resist patterns and process for the production of electronic devices

Resist pattern thickening material and process for forming resist pattern, and semiconductor device and process for manufacturing the same

Resist pattern-improving material and a method for preparing a resist pattern by using the same

Resist pattern thickening material, resist pattern and process for forming the same, and semiconductor device and process for manufacturing the same

Negative resist composition, a method for forming a resist pattern thereof, and a method for fabricating a semiconductor device

Negative resist composition, method for the formation of resist patterns and process for the production of electronic devices

Negative resist composition, method for the formation of resist patterns and process for the production of electronic devices

Alkali-soluble siloxane polymer, positive type resist composition, resist pattern, process for forming the same, electronic device and process for manufacturing the same

Resist pattern thickening material, method for forming resist pattern, semiconductor device and method for manufacturing the same

Manufacturing process of semiconductor device

Resist pattern thickening material and process for forming resist pattern, and semiconductor device and process for producing the same

Resist pattern thickening material and process for forming resist pattern, and semiconductor device and process for manufacturing the same

Resist pattern thickening material, resist pattern and forming process thereof, and semiconductor device and manufacturing process thereof

Resist pattern thickening material, process for forming resist pattern, and process for manufacturing semiconductor device

Resist pattern thickening material, resist pattern and process for forming the same, and semiconductor device and process for manufacturing the same

Resist pattern thickening material and process for forming resist pattern, and semiconductor device and process for manufacturing the same

Resist pattern thickening material and process for forming the same, and semiconductor device and process for manufacturing the same

Silicon-containing polymer, process for its production, resist composition employing it, pattern-forming method and electronic device fabrication method

Negative resist composition, a method for forming a resist pattern thereof, and a method for fabricating a semiconductor device

Negative resist composition, method for the formation of resist patterns and process for the production of electronic devices

Negative resist composition, method for the formation of resist patterns and process for the production of electronic devices

Resist composition and pattern forming process

Alkali-soluble siloxane polymer, positive type resist composition, resist pattern, process for forming the same, electronic device and process for manufacturing the same

Resist composition, method for forming resist pattern, and semiconductor device and method for manufacturing the same

Resist composition, method of forming resist pattern, semiconductor device and method of manufacturing thereof

Resist pattern thickening material, process for forming resist pattern, and process for manufacturing semiconductor device

KOZAWA MIWA

Pattern forming method, method for manufacturing semiconductor device, and material for forming coating layer of resist pattern

Resist pattern improving material, method for forming resist pattern, and method for producing semiconductor device

Process for forming resist pattern, semiconductor device and fabrication thereof

Resist cover film forming material, resist pattern forming method, and electronic device and method for manufacturing the same

Resist pattern thickening material and process for forming resist pattern, and semiconductor device and method for manufacturing the same

Method for forming resist pattern, semiconductor device and production method thereof

Resist pattern improving material, method for forming resist pattern, and method for producing semiconductor device

Method for forming resist pattern, semiconductor device and production method thereof

Resist composition, method for forming resist pattern, and method for producing electronic device

Resist pattern thickening material and process for forming resist pattern, and semiconductor device and process for producing the same

Resist pattern thickening material, semiconductor device, and production method thereof

NOZAKI KOJI

Resist pattern swelling material, and method for patterning using same

Resist pattern thickening material, method for forming resist pattern, semiconductor device and method for manufacturing the same

Resist pattern improving material, method for forming resist pattern, method for producing semiconductor device, and semiconductor device