Inventor

DE LARIOS JOHN M

US58 patents

⚠️ This page may combine multiple inventors who share the name “DE LARIOS JOHN M”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

DE LARIOS JOHN M

LAM RES CORP

Methods and systems for processing a substrate using a dynamic liquid meniscus

Apparatus and method for providing a confined liquid for immersion lithography

Single wafer residue, thin film removal and clean

Cleaning solution and method for cleaning semiconductor substrates after polishing of cooper film

Method and apparatus for drying semiconductor wafer surfaces using a plurality of inlets and outlets held in close proximity to the wafer surfaces

Methods and systems for processing a bevel edge of a substrate using a dynamic liquid meniscus

Apparatus and method for depositing and planarizing thin films of semiconductor wafers

Proximity meniscus manifold

Method and apparatus for processing wafer surfaces using thin, high velocity fluid layer

Cleaning solutions for semiconductor substrates after polishing of copper film

Methods and apparatus for cleaning semiconductor substrates after polishing of copper film

Drip manifold for uniform chemical delivery

Method and material for cleaning a substrate

Method and system for using a two-phases substrate cleaning compound

Methods for providing a confined liquid for immersion lithography

Method for removing contamination from a substrate and for making a cleaning solution

Cleaning compound and method and system for using the cleaning compound

Method and apparatus for removing contamination from substrate

Wafer edge surface treatment with liquid meniscus

System and method for integrating in-situ metrology within a wafer process

System processing a substrate using dynamic liquid meniscus

Methods for drying semiconductor wafer surfaces using a plurality of inlets and outlets held in close proximity to the wafer surfaces

Substrate brush scrubbing and proximity cleaning-drying sequence using compatible chemistries, and method, apparatus, and system for implementing the same

Methods and systems for processing a substrate using a dynamic liquid meniscus

Substrate brush scrubbing and proximity cleaning-drying sequence using compatible chemistries, and method, apparatus, and system for implementing the same

Method and apparatus for uniformly applying a multi-phase cleaning solution to a substrate

Method and apparatus for removal of thin films from wafers

System and apparatus for evaluating the effectiveness of wafer drying operations

Methods for evaluating advanced wafer drying techniques

Apparatus and method for depositing and planarizing thin films of semiconductor wafers

Method and apparatus for transporting a substrate using non-newtonian fluid

Method and apparatus for transporting a substrate using non-Newtonian fluid

Method and apparatus for cleaning a substrate using non-Newtonian fluids

Apparatuses and methods for cleaning a substrate

Controls of ambient environment during wafer drying using proximity head

Apparatuses and methods for cleaning a substrate

Substrate proximity drying using in-situ local heating of substrate and substrate carrier point of contact, and methods, apparatus, and systems for implementing the same

Methods and systems for processing a bevel edge of a substrate using a dynamic liquid meniscus

Methods for contained chemical surface treatment

Method and apparatus for cleaning semiconductor wafers using compressed and/or pressurized foams, bubbles, and/or liquids

Method and system for uniformly applying a multi-phase cleaning solution to a substrate

Methods for processing wafer surfaces using thin, high velocity fluid layer

FREER ERIK M

Material for cleaning a substrate

Method and apparatus for particle removal

Substrate preparation using stabilized fluid solutions and methods for making stable fluid solutions

Apparatus and system for cleaning a substrate

Method and apparatus for removing contamination from substrate

Cleaning compound and method and system for using the cleaning compound

DE LARIOS JOHN M

Method and apparatus for cleaning a substrate using non-newtonian fluids

KOROLIK MIKHAIL

Two-phase substrate cleaning material