Inventor

RAVKIN MICHAEL

US61 patents

⚠️ This page may combine multiple inventors who share the name “RAVKIN MICHAEL”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

RAVKIN MICHAEL

LAM RES CORP

Methods and systems for processing a substrate using a dynamic liquid meniscus

Apparatus and method for providing a confined liquid for immersion lithography

Concentric proximity processing head

Substrate cleaning brush preparation sequence, method, and system

Method and apparatus for processing a wafer

Brush box containment apparatus

Methods for analyzing the effectiveness of wafer backside cleaning

Apparatus for processing a wafer

Method and apparatus for processing wafer surfaces using thin, high velocity fluid layer

System and method for a combined contact and non-contact wafer cleaning module

Drying a substrate using a combination of substrate processing technologies

Method and apparatus for asymmetric processing of front side and back side of semiconductor substrates

System and method of defect optimization for chemical mechanical planarization of polysilicon

Method and material for cleaning a substrate

Methods for providing a confined liquid for immersion lithography

Method for removing contamination from a substrate and for making a cleaning solution

Cleaning compound and method and system for using the cleaning compound

Method and apparatus for removing contamination from substrate

System and method for integrating in-situ metrology within a wafer process

Method and apparatus to decouple power and cavitation for megasonic cleaning applications

Stress free etch processing in combination with a dynamic liquid meniscus

Method for post-etch and strip residue removal on coral films

Megasonic substrate processing module

System processing a substrate using dynamic liquid meniscus

Substrate brush scrubbing and proximity cleaning-drying sequence using compatible chemistries, and method, apparatus, and system for implementing the same

Methods and systems for processing a substrate using a dynamic liquid meniscus

Substrate brush scrubbing and proximity cleaning-drying sequence using compatible chemistries, and method, apparatus, and system for implementing the same

System and method for a combined contact and non-contact wafer cleaning module

Wheel and conveyor system for transporting semiconductor wafers

Method for transferring wafers from a conveyor system to a wafer processing station

Method and apparatus for removal of thin films from wafers

Method and apparatus for cleaning of semiconductor substrates using hydrofluoric acid (HF)

Apparatus and method for confined area planarization

Chemically assisted mechanical cleaning of MRAM structures

Method and apparatus for megasonic cleaning of patterned substrates

FREER ERIK M

Method and apparatus for cleaning a semiconductor substrate

Material for cleaning a substrate

Method and apparatus for cleaning a semiconductor substrate

Method and apparatus for particle removal

Substrate preparation using stabilized fluid solutions and methods for making stable fluid solutions

Apparatus and system for cleaning a substrate

Method for removing contamination from a substrate and for making a cleaning solution

Methods for cleaning a semiconductor substrate

Method and apparatus for removing contamination from substrate

Substrate cleaning technique employing multi-phase solution

Cleaning compound and method and system for using the cleaning compound

ONTRAK SYSTEMS INC

Method and apparatus for cleaning of semiconductor substrates using hydrofluoric acid (HF)

Brush assembly apparatus

LAM RES AG

Method and apparatus for processing wafer-shaped articles

Method and apparatus for processing wafer-shaped articles