Inventor

KOROLIK MIKHAIL

US67 patents

⚠️ This page may combine multiple inventors who share the name “KOROLIK MIKHAIL”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

KOROLIK MIKHAIL

LAM RES CORP

Apparatus and method for providing a confined liquid for immersion lithography

Method and apparatus for thin metal film thickness measurement

Method and apparatus for processing wafer surfaces using thin, high velocity fluid layer

Method and material for cleaning a substrate

Method and system for using a two-phases substrate cleaning compound

Methods for providing a confined liquid for immersion lithography

Method for removing contamination from a substrate and for making a cleaning solution

Cleaning compound and method and system for using the cleaning compound

Method and apparatus for removing contamination from substrate

Method and apparatus for atomic layer deposition (ALD) in a proximity system

Stress free etch processing in combination with a dynamic liquid meniscus

Apparatus and method for integrated surface treatment and deposition for copper interconnect

Method and apparatus for transporting a substrate using non-newtonian fluid

Method and apparatus for transporting a substrate using non-Newtonian fluid

Method and apparatus for cleaning a substrate using non-Newtonian fluids

Thermal methods for cleaning post-CMP wafers

Controls of ambient environment during wafer drying using proximity head

Substrate proximity drying using in-situ local heating of substrate and substrate carrier point of contact, and methods, apparatus, and systems for implementing the same

APPLIED MATERIALS INC

Chlorine-based hardmask removal

Selectively etching metals and metal nitrides conformally

Non-local plasma oxide etch

Selective titanium nitride etch

Silicon germanium processing

Non-local plasma oxide etch

Tungsten oxide processing

Methods for selective etching of a silicon material using HF gas without nitrogen etchants

Etch suppression with germanium

Fluorine-based hardmask removal

Germanium etching systems and methods

Self-limiting atomic thermal etching systems and methods

Method for fabricating junctions and spacers for horizontal gate all around devices

Methods for selective etching of a silicon material using HF gas without nitrogen etchants

Self-aligned shielding of silicon oxide

FREER ERIK M

Method and apparatus for cleaning a semiconductor substrate

Material for cleaning a substrate

Method and apparatus for cleaning a semiconductor substrate

Method and apparatus for particle removal

Substrate preparation using stabilized fluid solutions and methods for making stable fluid solutions

Apparatus and system for cleaning a substrate

Method for removing contamination from a substrate and for making a cleaning solution

Methods for cleaning a semiconductor substrate

Method and apparatus for removing contamination from substrate

Substrate cleaning technique employing multi-phase solution

Cleaning compound and method and system for using the cleaning compound

YOON HYUNGSUK ALEXANDER

Apparatus and method for atomic layer deposition

Methods for atomic layer deposition

SILICON GENESIS CORP

Method for fabricating multi-layered substrates

GOTKIS YEHIEL

Methods and apparatus for thin metal film thickness measurement

DE LARIOS JOHN M

Method and apparatus for cleaning a substrate using non-newtonian fluids

KOROLIK MIKHAIL

Two-phase substrate cleaning material