Inventor

TSUCHIHASHI TORU

JP31 patents

⚠️ This page may combine multiple inventors who share the name “TSUCHIHASHI TORU”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

TSUCHIHASHI TORU

FUJIFILM CORP

Positive resist composition and pattern forming method using the same

Pattern forming method and electronic device manufacturing method

Pattern forming method, method for manufacturing electronic device, and laminate

Rinsing liquid and pattern forming method

Treatment liquid and pattern forming method

Treatment liquid and pattern forming method

Treatment liquid and pattern forming method

Pattern forming method, resist pattern, method for manufacturing electronic device, and electronic device

Pattern forming method, method for manufacturing electronic device, and laminate

Positive resist composition and pattern forming method using the same

Rinsing liquid, pattern forming method, and electronic device manufacturing method

Developer, pattern forming method, and electronic device manufacturing method

Actinic ray-sensitive or radiation-sensitive resin composition, and, actinic ray-sensitive or radiation-sensitive film and pattern forming method, each using the composition

Method for developing resist, method for forming a resist pattern, method for producing a mold, and developing fluid utilized in these methods

Actinic ray-sensitive or radiation-sensitive resin composition, resist film, resist-coated mask blank, photomask and pattern forming method, and method for producing electronic device using them, and electronic device

Pattern forming method and method for manufacturing electronic device

Actinic ray-sensitive or radiation-sensitive resin composition and method of forming pattern therewith

TSUCHIHASHI TORU

Negative resist pattern forming method, developer and negative chemical-amplification resist composition used therefor, and resist pattern

Resist pattern forming method, resist pattern, crosslinkable negative chemical amplification resist composition for organic solvent development, resist film and resist-coated mask blanks

Resist pattern forming method, resist pattern, crosslinkable negative resist composition, nanoimprint mold and photomask

Resist pattern forming method, resist pattern, positive resist composition, nanoimprint mold and photomask

MITSUBISHI RAYON CO

Fine polymer particles for plastisol, process for producing the same, and halogen-free plastisol composition and article made with the same

Fine polymer particles for plastisol, process for producing the same, and halogen-free plastisol composition and article made with the same

TAKAHASHI HIDENORI

Photosensitive composition, pattern-forming method using the composition, and resin used in the composition

Actinic ray-sensitive or radiation-sensitive resin composition, resist film, pattern forming method using the same, and resin

TSUCHIMURA TOMOTAKA

Actinic ray-sensitive or radiation-sensitive resin composition and method of forming pattern with the composition

TSUBAKI HIDEAKI

Organic solvent development or multiple development pattern-forming method using electron beams or EUV rays

KATAOKA SHOHEI

Actinic-ray- or radiation-sensitive resin composition and method of forming pattern using the same

MIZUTANI KAZUYOSHI

Resist composition and pattern forming method using the same

KATO KEITA

Pattern forming method and resist composition

IWATO KAORU

Pattern forming method and resist composition