Inventor
NARASIMHAN MURALI
US17 patents
⚠️ This page may combine multiple inventors who share the name “NARASIMHAN MURALI”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
APPLIED MATERIALS INC
16 patentsUS6432819B1Aug 13, 2002
Method and apparatus of forming a sputtered doped seed layer
APPLIED MATERIALS INC302 citations99
US6122921ASep 26, 2000
Shield to prevent cryopump charcoal array from shedding during cryo-regeneration
APPLIED MATERIALS INC151 citations99
US6042700AMar 28, 2000
Adjustment of deposition uniformity in an inductively coupled plasma source
APPLIED MATERIALS INC77 citations96
US6001227ADec 14, 1999
Target for use in magnetron sputtering of aluminum for forming metallization films having low defect densities and methods for manufacturing and using such target
APPLIED MATERIALS INC40 citations96
US6139701AOct 31, 2000
Copper target for sputter deposition
APPLIED MATERIALS INC85 citations95
US6391163B1May 21, 2002
Method of enhancing hardness of sputter deposited copper films
APPLIED MATERIALS INC37 citations92
US6372301B1Apr 16, 2002
Method of improving adhesion of diffusion layers on fluorinated silicon dioxide
APPLIED MATERIALS INC25 citations92
US6315872B1Nov 13, 2001
Coil for sputter deposition
APPLIED MATERIALS INC20 citations92
US6228186B1May 8, 2001
Method for manufacturing metal sputtering target for use in DC magnetron so that target has reduced number of conduction anomalies
APPLIED MATERIALS INC23 citations92
US6171455B1Jan 9, 2001
Target for use in magnetron sputtering of aluminum for forming metallization films having low defect densities and methods for manufacturing and using such target
APPLIED MATERIALS INC15 citations92
US6277253B1Aug 21, 2001
External coating of tungsten or tantalum or other refractory metal on IMP coils
APPLIED MATERIALS INC21 citations91
US6077353AJun 20, 2000
Pedestal insulator for a pre-clean chamber
APPLIED MATERIALS INC35 citations90
US11244844B2Feb 8, 2022
High flow velocity, gas-purged, side storage pod apparatus, assemblies, and methods
APPLIED MATERIALS INC11 citations85
US6126791AOct 3, 2000
Target for use in magnetron sputtering of aluminum for forming metallization films having low defect densities and methods for manufacturing and using such target
APPLIED MATERIALS INC12 citations82
US11749537B2Sep 5, 2023
Side storage pods, equipment front end modules, and methods for operating equipment front end modules
APPLIED MATERIALS INC0 citations62
US11569102B2Jan 31, 2023
Oxidation inhibiting gas in a manufacturing system
APPLIED MATERIALS INC0 citations46