P

Inventor

NISHIHARA SHINJI

JP42 patents
⚠️ This page may combine multiple inventors who share the name “NISHIHARA SHINJI”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

HITACHI LTD

18 patents
US5904556AMay 18, 1999

Method for making semiconductor integrated circuit device having interconnection structure using tungsten film

HITACHI LTD63 citations95
US5444012AAug 22, 1995

Method for manufacturing semiconductor integrated circuit device having a fuse element

HITACHI LTD84 citations95
US6656828B1Dec 2, 2003

Method of forming bump electrodes

HITACHI LTD102 citations93
US6583049B2Jun 24, 2003

Semiconductor integrated circuit device and method for making the same

HITACHI LTD13 citations92
US6503803B2Jan 7, 2003

Method of fabricating a semiconductor integrated circuit device for connecting semiconductor region and electrical wiring metal via titanium silicide layer

HITACHI LTD16 citations92
US6031288AFeb 29, 2000

Semiconductor integrated circuit device for connecting semiconductor region and electrical wiring metal via titanium silicide layer and method of fabrication thereof

HITACHI LTD36 citations92
US5188975AFeb 23, 1993

Method of producing a connection hole for a DRAM having at least three conductor layers in a self alignment manner.

HITACHI LTD38 citations92
US7064437B2Jun 20, 2006

Semiconductor device having aluminum conductors

HITACHI LTD5 citations74
US6858484B2Feb 22, 2005

Method of fabricating semiconductor integrated circuit device

HITACHI LTD5 citations74
US6476492B2Nov 5, 2002

Semiconductor device having a capacitor and an interconnect layer with molybdenum-containing tungsten

HITACHI LTD5 citations74
US6472754B2Oct 29, 2002

Semiconductor device with improved arrangements to avoid breakage of tungsten interconnector

HITACHI LTD13 citations74
US6326216B1Dec 4, 2001

Process for producing semiconductor integrated circuit device

HITACHI LTD13 citations73
US6300237B1Oct 9, 2001

Semiconductor integrated circuit device and method for making the same

HITACHI LTD7 citations73
US6268658B1Jul 31, 2001

Semiconductor integrated circuit device for connecting semiconductor region and electrical wiring metal via titanium silicide layer and method of fabrication thereof

HITACHI LTD10 citations73
US6617691B2Sep 9, 2003

Semiconductor device

HITACHI LTD4 citations63
US6548904B2Apr 15, 2003

Semiconductor device having a capacitor and a metal interconnect layer with tungsten as a main constituent material and containing molybdenum

HITACHI LTD4 citations63
US6545362B2Apr 8, 2003

Semiconductor device and method of manufacturing the same

HITACHI LTD1 citations52
US6538329B2Mar 25, 2003

Semiconductor integrated circuit device and method for making the same

HITACHI LTD0 citations51

RENESAS TECH CORP

8 patents

FURUMURA YUJI

8 patents

PHILTECH INC

4 patents

NIKON CORP

2 patents

RENESAS ELECTRONICS CORP

1 patent

NIPPON KOGAKU KK

1 patent