Inventor
MIYAMOTO YUKI
JP24 patents
⚠️ This page may combine multiple inventors who share the name “MIYAMOTO YUKI”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
MITSUBISHI ELECTRIC CORP
7 patentsUS6323560B1Nov 27, 2001
Registration accuracy measurement mark, method of repairing defect of the mark, photomask having the mark, method of manufacturing the photo mask and method of exposure thereof
MITSUBISHI ELECTRIC CORP63 citations95
US6617080B1Sep 9, 2003
Photomask, semiconductor device, and method for exposing through photomask
MITSUBISHI ELECTRIC CORP26 citations90
US5868560AFeb 9, 1999
Reticle, pattern transferred thereby, and correction method
MITSUBISHI ELECTRIC CORP37 citations90
US5892291AApr 6, 1999
Registration accuracy measurement mark
MITSUBISHI ELECTRIC CORP15 citations81
US6374397B1Apr 16, 2002
Lot determination apparatus, lot determination method, and recording medium for storing the method
MITSUBISHI ELECTRIC CORP12 citations73
US6068952AMay 30, 2000
Registration accuracy measurement mark, method of repairing defect of the mark, photomask having the mark, method of manufacturing the photomask and method of exposure thereof
MITSUBISHI ELECTRIC CORP4 citations73
US6570643B1May 27, 2003
Semiconductor device, manufacturing method thereof and semiconductor manufacturing system
MITSUBISHI ELECTRIC CORP4 citations63
RENESAS TECH CORP
4 patentsUS6811939B2Nov 2, 2004
Focus monitoring method, focus monitoring system, and device fabricating method
RENESAS TECH CORP19 citations92
US6797443B2Sep 28, 2004
Focus monitoring method, focus monitoring apparatus, and method of manufacturing semiconductor device
RENESAS TECH CORP13 citations83
US6764794B2Jul 20, 2004
Photomask for focus monitoring
RENESAS TECH CORP11 citations72
US6890692B2May 10, 2005
Method of focus monitoring and manufacturing method for an electronic device
RENESAS TECH CORP2 citations61
SAEKI TOMOHIRO
3 patentsTDK CORP
2 patentsUS7312514B2Dec 25, 2007
High-permittivity insulation film, thin film capacity element, thin film multilayer capacitor, and production method of thin film capacity element
TDK CORP9 citations74
US7713877B2May 11, 2010
Method for fabricating dielectric on metal by baking dielectric precursor under reduced pressure atmosphere
TDK CORP2 citations62