P

Inventor

MATSUNO TADASHI

JP15 patents

Patents

15 patents
US6291891B1Sep 18, 2001

Semiconductor device manufacturing method and semiconductor device

TOSHIBA KK69 citations96
US6163067ADec 19, 2000

Semiconductor apparatus having wiring groove and contact hole in self-alignment manner

TOSHIBA KK49 citations96
US6046502AApr 4, 2000

Semiconductor device with improved adhesion between titanium-based metal layer and insulation film

TOSHIBA KK52 citations96
US5874779AFeb 23, 1999

Semiconductor device with improved adhesion between titanium-based metal wiring layer and insulation film

TOSHIBA KK58 citations96
US5753975AMay 19, 1998

Semiconductor device with improved adhesion between titanium-based metal wiring layer and insulation film

TOSHIBA KK44 citations96
US6051508AApr 18, 2000

Manufacturing method of semiconductor device

TOSHIBA KK81 citations94
US6368951B2Apr 9, 2002

Semiconductor device manufacturing method and semiconductor device

TOSHIBA KK16 citations92
US6127256AOct 3, 2000

Semiconductor device and method of manufacturing the same

TOSHIBA KK18 citations92
US5976972ANov 2, 1999

Method of making semiconductor apparatus having wiring groove and contact hole formed in a self-alignment manner

TOSHIBA KK38 citations92
US5966634AOct 12, 1999

Method of manufacturing semiconductor device having multi-layer wiring structure with diffusion preventing film

TOSHIBA KK41 citations92
US5850102ADec 15, 1998

Semiconductor device having a second insulating layer which includes carbon or fluorine at a density lower than a first insulating layer

TOSHIBA KK32 citations92
US6004887ADec 21, 1999

Semiconductor device with improved adhesion between titanium-based metal wiring layer and insulation film

TOSHIBA KK18 citations84
US5759915AJun 2, 1998

Method of forming semiconductor device having an improved buried electrode formed by selective CVD

TOSHIBA KK11 citations74
US5106782AApr 21, 1992

Method of manufacturing a semiconductor device

TOSHIBA KK9 citations74
US5948698ASep 7, 1999

Manufacturing method of semiconductor device using chemical mechanical polishing

TOSHIBA KK9 citations73