Inventor

RANJAN ALOK

US124 patents

⚠️ This page may combine multiple inventors who share the name “RANJAN ALOK”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

RANJAN ALOK

TOKYO ELECTRON LTD

Systems and methods of control for plasma processing

Method for etching high-K dielectric using pulsed bias power

Method for etching high-K dielectric using pulsed bias power

Method for etching high-K dielectric using pulsed bias power

Methods for extreme ultraviolet (EUV) resist patterning development

Method of detecting plasma discharge in a plasma processing system

Methods for high precision etching of substrates

Method for selectivity enhancement during dry plasma etching

Method for roughness improvement and selectivity enhancement during arc layer etch via adjustment of carbon-fluorine content

Method for roughness improvement and selectivity enhancement during arc layer etch using hydrogen

Method for roughness improvement and selectivity enhancement during arc layer etch using carbon

Method to improve etch selectivity during silicon nitride spacer etch

Methods for anisotropic etch of silicon-based materials with selectivity to organic materials

Defect correction on metal resists

Systems and methods for ESC temperature control

Method for deep silicon etching using gas pulsing

Aspect ratio dependent deposition to improve gate spacer profile, fin-loss and hardmask-loss for FinFET scheme

Mode-switching plasma systems and methods of operating thereof

Method for dry etching compound materials

Methods for high precision plasma etching of substrates

Methods for high precision plasma etching of substrates

Method for laterally trimming a hardmask

Remote source pulsing with advanced pulse control

Method of etching silicon nitride layers for the manufacture of microelectronic workpieces

Method of preferential silicon nitride etching using sulfur hexafluoride

Methods for cyclic etching of a patterned layer

Method of quasi-atomic layer etching of silicon nitride

Method of anisotropic extraction of silicon nitride mandrel for fabrication of self-aligned block structures

Virtual metrology enhanced plasma process optimization method

Etching method to form spacers having multiple film layers

Method of plasma etching of silicon-containing organic film using sulfur-based chemistry

Ion angle detector

Method for atomic layer etching

Apparatus for edge control during plasma processing

Pulsed capacitively coupled plasma processes

Plasma processing methods using low frequency bias pulses

Method of forming a FET structure by selective deposition of film on source/drain contact

Systems and methods of control for plasma processing

Methods for extreme ultraviolet (EUV) resist patterning development

Methods for real-time pulse measurement and pulse timing adjustment to control plasma process performance

Fast neutral generation for plasma processing

Method and apparatus for plasma processing

RANJAN ALOK

Method for etching high-k dielectric using pulsed bias power

Method for reducing damage to low-k gate spacer during etching

Formation of SiOCl-containing layer on exposed low-k surfaces to reduce low-k damage

Sidewall and chamfer protection during hard mask removal for interconnect patterning

Formation of SiOCl-containing layer on spacer sidewalls to prevent CD loss during spacer etch

TATA CONSULTANCY SERVICES LTD

Aerial communication framework for providing communication services to users trapped in emergency

System and method for detecting on-street parking violations

DELL PRODUCTS LP

Securing devices using network traffic analysis and software-defined networking (SDN)