Inventor
CZORNOMAZ LUKAS
CH56 patents
⚠️ This page may combine multiple inventors who share the name “CZORNOMAZ LUKAS”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
IBM
49 patentsUS9891112B1Feb 13, 2018
Radiation detector
IBM36 citations93
US9570169B1Feb 14, 2017
Resistive memory device
IBM30 citations92
US9129863B2Sep 8, 2015
Method to form dual channel group III-V and Si/Ge FINFET CMOS
IBM18 citations92
US9748098B2Aug 29, 2017
Controlled confined lateral III-V epitaxy
IBM6 citations84
US10340661B2Jul 2, 2019
Electro-optical device with lateral current injection regions
IBM13 citations83
US9864134B2Jan 9, 2018
Semiconductor structure and method for manufacturing a semiconductor structure
IBM9 citations83
US9239424B2Jan 19, 2016
Semiconductor device and method for fabricating the same
IBM7 citations83
US10810506B1Oct 20, 2020
Qubit biasing scheme using non-volatile devices
IBM10 citations82
US9735010B1Aug 15, 2017
Fabrication of semiconductor fin structures
IBM9 citations82
US9870953B2Jan 16, 2018
System on chip material co-integration
IBM4 citations73
US9515090B2Dec 6, 2016
Method to form dual channel group III-V and Si/Ge FINFET CMOS and integrated circuit fabricated using the method
IBM3 citations73
US9437427B1Sep 6, 2016
Controlled confined lateral III-V epitaxy
IBM4 citations73
US10734787B2Aug 4, 2020
Electro-optical device with lateral current injection regions
IBM1 citations72
US10304934B2May 28, 2019
Fabricating raised source drain contacts of a CMOS structure
IBM1 citations72
US9984929B1May 29, 2018
Fabricating contacts of a CMOS structure
IBM4 citations72
US9881921B2Jan 30, 2018
Fabricating a dual gate stack of a CMOS structure
IBM2 citations72
US9786664B2Oct 10, 2017
Fabricating a dual gate stack of a CMOS structure
IBM2 citations72
US10447006B2Oct 15, 2019
Electro-optical device with asymmetric, vertical current injection ohmic contacts
IBM2 citations71
US10395732B2Aug 27, 2019
Resistive memory apparatus using variable-resistance channels with high- and low-resistance regions
IBM2 citations71
US10249492B2Apr 2, 2019
Fabrication of compound semiconductor structures
IBM2 citations71
US9640394B2May 2, 2017
Method for fabricating a semiconductor structure
IBM2 citations71
US9513436B2Dec 6, 2016
Semiconductor device
IBM5 citations71
US9704757B1Jul 11, 2017
Fabrication of semiconductor structures
IBM2 citations70
US9997409B1Jun 12, 2018
Fabricating contacts of a CMOS structure
IBM1 citations62
US9917164B1Mar 13, 2018
Fabricating raised source drain contacts of a CMOS structure
IBM1 citations62
US10897121B2Jan 19, 2021
Lateral current injection electro-optical device with well-separated doped III-V layers structured as photonic crystals
IBM0 citations61
US10840264B2Nov 17, 2020
Ultra-thin-body GaN on insulator device
IBM1 citations61
US9459405B2Oct 4, 2016
Method for fabricating a semiconductor device for use in an optical application
IBM2 citations61
US11270999B2Mar 8, 2022
Capacitorless DRAM cell
IBM0 citations59
US11031402B1Jun 8, 2021
Capacitorless dram cell
IBM0 citations59
US11070029B2Jul 20, 2021
Method of forming an electro-optical device with lateral current injection regions
IBM0 citations58
US9252157B2Feb 2, 2016
Method to form group III-V and Si/Ge FINFET on insulator and integrated circuit fabricated using the method
IBM1 citations52
US9123585B1Sep 1, 2015
Method to form group III-V and Si/Ge FINFET on insulator
IBM1 citations52
US10763644B2Sep 1, 2020
Lateral current injection electro-optical device with well-separated doped III-V layers structured as photonic crystals
IBM0 citations51
US10594111B2Mar 17, 2020
Lateral current injection electro-optical device with well-separated doped III-V layers structured as photonic crystals
IBM0 citations51
US10529771B2Jan 7, 2020
Array of optoelectronic structures and fabrication thereof
IBM0 citations51
US10410926B2Sep 10, 2019
Fabricating contacts of a CMOS structure
IBM0 citations51
US10103234B1Oct 16, 2018
Fabricating raised source drain contacts of a CMOS structure
IBM0 citations51
US9953125B2Apr 24, 2018
Design/technology co-optimization platform for high-mobility channels CMOS technology
IBM1 citations51
US9923022B2Mar 20, 2018
Array of optoelectronic structures and fabrication thereof
IBM0 citations51
US9823414B2Nov 21, 2017
Method for fabricating a semiconductor device for use in an optical application
IBM0 citations51
US9564452B1Feb 7, 2017
Fabrication of hybrid semiconductor circuits
IBM0 citations51
US11183978B2Nov 23, 2021
Low-noise amplifier with quantized conduction channel
IBM0 citations50
US10529562B2Jan 7, 2020
Fabrication of compound semiconductor structures
IBM0 citations50
US10424478B2Sep 24, 2019
Fabrication of semiconductor fin structures
IBM0 citations50
US10037800B2Jul 31, 2018
Resistive memory apparatus using variable-resistance channels with high- and low-resistance regions
IBM0 citations50
US11674237B2Jun 13, 2023
Method for fabricating a crystalline metal-phosphide hetero-layer by converting first and second crystalline metal-source layers into first and second crystalline metal phosphide layers
IBM0 citations49
US11621340B2Apr 4, 2023
Field-effect transistor structure and fabrication method
IBM0 citations49
US10256092B2Apr 9, 2019
Fabrication of semiconductor structures
IBM0 citations49
NANOMADE CONCEPT
1 patentShowing the top 50 of 56 patents by PatentIndex Score.