P

Inventor

HONG CHEONG MIN

US50 patents
⚠️ This page may combine multiple inventors who share the name “HONG CHEONG MIN”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

FREESCALE SEMICONDUCTOR INC

20 patents
US8901632B1Dec 2, 2014

Non-volatile memory (NVM) and high-K and metal gate integration using gate-last methodology

FREESCALE SEMICONDUCTOR INC40 citations94
US8969940B1Mar 3, 2015

Method of gate strapping in split-gate memory cell with inlaid gate

FREESCALE SEMICONDUCTOR INC21 citations92
US9437500B1Sep 6, 2016

Method of forming supra low threshold devices

FREESCALE SEMICONDUCTOR INC8 citations84
US9275864B2Mar 1, 2016

Method to form a polysilicon nanocrystal thin film storage bitcell within a high k metal gate platform technology using a gate last process to form transistor gates

FREESCALE SEMICONDUCTOR INC19 citations84
US9142566B2Sep 22, 2015

Method of forming different voltage devices with high-K metal gate

FREESCALE SEMICONDUCTOR INC10 citations84
US9129855B2Sep 8, 2015

Non-volatile memory (NVM) and high-k and metal gate integration using gate-first methodology

FREESCALE SEMICONDUCTOR INC7 citations84
US8853027B2Oct 7, 2014

Split gate flash cell

FREESCALE SEMICONDUCTOR INC9 citations84
US9653164B2May 16, 2017

Method for integrating non-volatile memory cells with static random access memory cells and logic transistors

FREESCALE SEMICONDUCTOR INC8 citations82
US7838922B2Nov 23, 2010

Electronic device including trenches and discontinuous storage elements

FREESCALE SEMICONDUCTOR INC9 citations82
US7572699B2Aug 11, 2009

Process of forming an electronic device including fins and discontinuous storage elements

FREESCALE SEMICONDUCTOR INC10 citations82
US9368499B2Jun 14, 2016

Method of forming different voltage devices with high-k metal gate

FREESCALE SEMICONDUCTOR INC5 citations73
US7651916B2Jan 26, 2010

Electronic device including trenches and discontinuous storage elements and processes of forming and using the same

FREESCALE SEMICONDUCTOR INC7 citations72
US9548314B1Jan 17, 2017

Method of making a non-volatile memory (NVM) with trap-up reduction

FREESCALE SEMICONDUCTOR INC2 citations67
US8048738B1Nov 1, 2011

Method for forming a split gate device

FREESCALE SEMICONDUCTOR INC3 citations63
US7871886B2Jan 18, 2011

Nanocrystal memory with differential energy bands and method of formation

FREESCALE SEMICONDUCTOR INC4 citations63
US9847397B2Dec 19, 2017

Method of forming split gate memory with improved reliability

FREESCALE SEMICONDUCTOR INC0 citations52
US9559178B2Jan 31, 2017

Non-volatile memory (NVM) cell and device structure integration

FREESCALE SEMICONDUCTOR INC1 citations52
US9331092B2May 3, 2016

Methods for forming contact landing regions in split-gate non-volatile memory (NVM) cell arrays

FREESCALE SEMICONDUCTOR INC0 citations52
US9397201B2Jul 19, 2016

Non-volatile memory (NVM) cell and a method of making

FREESCALE SEMICONDUCTOR INC0 citations51
US10026820B2Jul 17, 2018

Split gate device with doped region and method therefor

FREESCALE SEMICONDUCTOR INC0 citations42

HONG CHEONG MIN

11 patents

ZHOU FENG

4 patents

PERERA ASANGA H

3 patents

NXP BV

3 patents

KANG SUNG-TAEG

2 patents

YATER JANE A

2 patents

BAKER JR FRANK K

1 patent

WINSTEAD BRIAN A

1 patent

NXP USA INC

1 patent

WILLIAMS JACOB T

1 patent

LI CHI-NAN

1 patent