Inventor
KYE JONGWOOK
US88 patents
⚠️ This page may combine multiple inventors who share the name “KYE JONGWOOK”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
GLOBALFOUNDRIES INC
32 patentsUS8954913B1Feb 10, 2015
Methods of generating circuit layouts that are to be manufactured using SADP routing techniques and virtual non-mandrel mask rules
GLOBALFOUNDRIES INC43 citations98
US9437588B1Sep 6, 2016
Middle of-line architecture for dense library layout using M0 hand-shake
GLOBALFOUNDRIES INC26 citations94
US8918746B1Dec 23, 2014
Cut mask aware contact enclosure rule for grating and cut patterning solution
GLOBALFOUNDRIES INC19 citations93
US9202751B2Dec 1, 2015
Transistor contacts self-aligned in two dimensions
GLOBALFOUNDRIES INC13 citations92
US9105510B2Aug 11, 2015
Double sidewall image transfer process
GLOBALFOUNDRIES INC16 citations92
US8921225B2Dec 30, 2014
Method for off-grid routing structures utilizing self aligned double patterning (SADP) technology
GLOBALFOUNDRIES INC19 citations92
US8881083B1Nov 4, 2014
Methods for improving double patterning route efficiency
GLOBALFOUNDRIES INC19 citations92
US9818651B2Nov 14, 2017
Methods, apparatus and system for a passthrough-based architecture
GLOBALFOUNDRIES INC15 citations91
US10147714B2Dec 4, 2018
Method, apparatus, and system for two-dimensional power rail to enable scaling of a standard cell
GLOBALFOUNDRIES INC9 citations84
US9727685B2Aug 8, 2017
Method, apparatus, and system for improved standard cell design and routing for improving standard cell routability
GLOBALFOUNDRIES INC10 citations84
US9679809B1Jun 13, 2017
Method of forming self aligned continuity blocks for mandrel and non-mandrel interconnect lines
GLOBALFOUNDRIES INC8 citations84
US9437481B2Sep 6, 2016
Self-aligned double patterning process for two dimensional patterns
GLOBALFOUNDRIES INC15 citations84
US9431300B1Aug 30, 2016
MOL architecture enabling ultra-regular cross couple
GLOBALFOUNDRIES INC18 citations84
US9330221B2May 3, 2016
Mask-aware routing and resulting device
GLOBALFOUNDRIES INC9 citations84
US9324722B1Apr 26, 2016
Utilization of block-mask and cut-mask for forming metal routing in an IC device
GLOBALFOUNDRIES INC16 citations84
US9159724B2Oct 13, 2015
Cross-coupling-based design using diffusion contact structures
GLOBALFOUNDRIES INC8 citations84
US9147653B2Sep 29, 2015
Method for off-grid routing structures utilizing self aligned double patterning (SADP) technology
GLOBALFOUNDRIES INC12 citations84
US9122830B2Sep 1, 2015
Wide pin for improved circuit routing
GLOBALFOUNDRIES INC12 citations84
US9041087B2May 26, 2015
Semiconductor devices having dielectric caps on contacts and related fabrication methods
GLOBALFOUNDRIES INC5 citations84
US8839168B2Sep 16, 2014
Self-aligned double patterning via enclosure design
GLOBALFOUNDRIES INC11 citations84
US9035679B2May 19, 2015
Standard cell connection for circuit routing
GLOBALFOUNDRIES INC13 citations83
US10347546B2Jul 9, 2019
Integrated circuit structure including power rail and tapping wire with method of forming same
GLOBALFOUNDRIES INC2 citations73
US10204861B2Feb 12, 2019
Structure with local contact for shorting a gate electrode to a source/drain region
GLOBALFOUNDRIES INC2 citations73
US9798852B2Oct 24, 2017
Methods of design rule checking of circuit designs
GLOBALFOUNDRIES INC2 citations73
US9660040B2May 23, 2017
Transistor contacts self-aligned two dimensions
GLOBALFOUNDRIES INC2 citations73
US9613177B2Apr 4, 2017
Methods of generating circuit layouts that are to be manufactured using SADP routing techniques
GLOBALFOUNDRIES INC4 citations73
US9582629B2Feb 28, 2017
Methods of generating circuit layouts using self-alligned double patterning (SADP) techniques
GLOBALFOUNDRIES INC5 citations73
US9536035B2Jan 3, 2017
Wide pin for improved circuit routing
GLOBALFOUNDRIES INC2 citations73
US9536778B2Jan 3, 2017
Self-aligned double patterning process for metal routing
GLOBALFOUNDRIES INC6 citations73
US9519745B2Dec 13, 2016
Method and apparatus for assisted metal routing
GLOBALFOUNDRIES INC5 citations73
US9472464B1Oct 18, 2016
Methods to utilize merged spacers for use in fin generation in tapered IC devices
GLOBALFOUNDRIES INC5 citations73
US9292647B2Mar 22, 2016
Method and apparatus for modified cell architecture and the resulting device
GLOBALFOUNDRIES INC4 citations73
ADVANCED MICRO DEVICES INC
10 patentsUS7315033B1Jan 1, 2008
Method and apparatus for reducing biological contamination in an immersion lithography system
ADVANCED MICRO DEVICES INC65 citations98
US6489068B1Dec 3, 2002
Process for observing overlay errors on lithographic masks
ADVANCED MICRO DEVICES INC87 citations98
US6602794B1Aug 5, 2003
Silylation process for forming contacts
ADVANCED MICRO DEVICES INC20 citations93
US6459480B1Oct 1, 2002
Measurement method of Zernike coma aberration coefficient
ADVANCED MICRO DEVICES INC28 citations93
US6829040B1Dec 7, 2004
Lithography contrast enhancement technique by varying focus with wavelength modulation
ADVANCED MICRO DEVICES INC32 citations92
US6710853B1Mar 23, 2004
Phase grating focus monitor using overlay technique
ADVANCED MICRO DEVICES INC22 citations92
US6556286B1Apr 29, 2003
Inspection system for the pupil of a lithographic tool
ADVANCED MICRO DEVICES INC24 citations92
US7422829B1Sep 9, 2008
Optical proximity correction (OPC) technique to compensate for flare
ADVANCED MICRO DEVICES INC12 citations84
US7125652B2Oct 24, 2006
Immersion lithographic process using a conforming immersion medium
ADVANCED MICRO DEVICES INC11 citations84
US6535280B1Mar 18, 2003
Phase-shift-moiré focus monitor
ADVANCED MICRO DEVICES INC14 citations83
RASHED MAHBUB
2 patentsWOO YOUNGTAG
1 patentMA YUANSHENG
1 patent(unassigned)
1 patentYUAN LEI
1 patentWANG YAN
1 patentADVANCED MICRO DEVICES IN
1 patentShowing the top 50 of 88 patents by PatentIndex Score.