Inventor
PARK KYOUNG SIL
KR2 patents
Patents
2 patentsUS9892915B2Feb 13, 2018
Hard mask composition, carbon nanotube layer structure, pattern forming method, and manufacturing method of semiconductor device
SAMSUNG ELECTRONICS CO LTD3 citations69
US10236185B2Mar 19, 2019
Method of forming patterns for semiconductor device
SAMSUNG ELECTRONICS CO LTD0 citations48