Inventor

BENJAMIN NEIL

US49 patents

⚠️ This page may combine multiple inventors who share the name “BENJAMIN NEIL”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

BENJAMIN NEIL

LAM RES CORP

Method and apparatus for controlling the spatial temperature distribution across the surface of a workpiece support

Method and apparatus for controlling the spatial temperature distribution across the surface of a workpiece support

Ceramic electrostatic chuck assembly and method of making

Temperature controlling method and apparatus for a plasma processing chamber

Heating plate with planar heater zones for semiconductor processing

RF generating system with fast loop control

Techniques for improving etch rate uniformity

Universal vacuum chamber including equipment modules such as a plasma generating source, vacuum pumping arrangement and/or cantilevered substrate support

High flow vacuum chamber including equipment modules such as a plasma generating source, vacuum pumping arrangement and/or cantilevered substrate support

Plasma processor for large workpieces

Apparatus and method for controlling the voltage applied to an electrostatic shield used in a plasma generator

Methods relating to wafer integrated plasma probe assembly arrays

Wafer integrated plasma probe assembly array

Apparatus for controlling the voltage applied to an electrostatic shield used in a plasma generator

Heating plate with planar heater zones for semiconductor processing

Voltage control sensor and control interface for radio frequency power regulation in a plasma reactor

Voltage control sensor and control interface for radio frequency power regulation in a plasma reactor

Scalable helicon wave plasma processing device with a non-cylindrical source chamber having a serpentine antenna

Capacitive manometer having reduced process drift

Temperature sensing system for temperature measurement in a high radio frequency environment

Substrate support with thermal zones for semiconductor processing

Substrate supports with multi-layer structure including independent operated heater zones

RF isolation for power circuitry

Multiplexed heater array using AC drive for semiconductor processing

Heating plate with heating zones for substrate processing and method of use thereof

Pump baffle and screen to improve etch uniformity

Power switching system for ESC with array of thermal control elements

Plasma processor coil

System and method for integrated multi-use optical alignment

Tunable multi-zone gas injection system

Wafer integrated plasma probe assembly array

Methods and apparatus for a hybrid capacitively-coupled and an inductively-coupled plasma processing system

Hybrid edge ring for plasma wafer processing

Method and apparatus for controlling spatial temperature distribution

Smart component-based management techniques in a substrate processing system

Method and apparatus for controlling the spatial temperature distribution across the surface of a workpiece support

Power switching system for ESC with array of thermal control elements

Hollow RF feed with coaxial DC power feed

Smart component-based management techniques in a substrate processing system

BENJAMIN NEIL

RF isolation for power circuitry

Integrated steerability array arrangement for minimizing non-uniformity

Method for controlling spatial temperature distribution across a semiconductor wafer

Method and apparatus for controlling the spatial temperature distribution across the surface of a workpiece support

Distributed power arrangements for localizing power delivery

SINGH HARMEET

Heating plate with planar heating zones for semiconductor processing

LAM RESARCH CORP

Voltage controller for electrostatic chuck of vacuum plasma processors

COOPERBERG DAVID J

Tunable multi-zone gas injection system

PEASE JOHN

Current peak spreading schemes for multiplexed heated array

MARAKHTANOV ALEXEI

Methods and apparatus for a hybrid capacitively-coupled and an inductively-coupled plasma processing system