Inventor
DHAS ARUL
US4 patents
Patents
4 patentsUS10704149B2Jul 7, 2020
Defect control and stability of DC bias in RF plasma-based substrate processing systems using molecular reactive purge gas
LAM RES CORP2 citations68
US10047438B2Aug 14, 2018
Defect control and stability of DC bias in RF plasma-based substrate processing systems using molecular reactive purge gas
LAM RES CORP3 citations66
US12522927B2Jan 13, 2026
DC bias circuit and gas delivery system for substrate processing systems
LAM RES CORP0 citations57
US9617637B2Apr 11, 2017
Systems and methods for improving deposition rate uniformity and reducing defects in substrate processing systems
LAM RES CORP0 citations29