Inventor
YODA HARUO
JP72 patents
⚠️ This page may combine multiple inventors who share the name “YODA HARUO”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
HITACHI LTD
40 patentsUS6538249B1Mar 25, 2003
Image-formation apparatus using charged particle beams under various focus conditions
HITACHI LTD118 citations99
US6329826B1Dec 11, 2001
Method and apparatus for inspecting integrated circuit pattern
HITACHI LTD95 citations99
US6172363B1Jan 9, 2001
Method and apparatus for inspecting integrated circuit pattern
HITACHI LTD185 citations99
US7026615B2Apr 11, 2006
Semiconductor inspection system
HITACHI LTD65 citations98
US6661507B2Dec 9, 2003
Pattern inspecting system and pattern inspecting method
HITACHI LTD47 citations96
US6087673AJul 11, 2000
Method of inspecting pattern and apparatus thereof
HITACHI LTD58 citations96
US3936800AFeb 3, 1976
Pattern recognition system
HITACHI LTD111 citations96
US4254400AMar 3, 1981
Image data processor
HITACHI LTD67 citations95
US7642514B2Jan 5, 2010
Charged particle beam apparatus
HITACHI LTD14 citations93
US7109485B2Sep 19, 2006
Charged particle beam apparatus
HITACHI LTD19 citations93
US6936818B2Aug 30, 2005
Charged particle beam apparatus
HITACHI LTD12 citations93
US6653633B2Nov 25, 2003
Charged particle beam apparatus
HITACHI LTD22 citations93
US6541784B1Apr 1, 2003
Electron beam exposure system and exposing method using an electron beam
HITACHI LTD20 citations93
US6246472B1Jun 12, 2001
Pattern inspecting system and pattern inspecting method
HITACHI LTD26 citations93
US5283440AFeb 1, 1994
Electron beam writing system used in a cell projection method
HITACHI LTD34 citations93
US5278421AJan 11, 1994
Pattern fabrication method using a charged particle beam and apparatus for realizing same
HITACHI LTD24 citations93
US5063492ANov 5, 1991
Motion control apparatus with function to self-form a series of motions
HITACHI LTD23 citations93
US7417444B2Aug 26, 2008
Method and apparatus for inspecting integrated circuit pattern
HITACHI LTD25 citations92
US7235782B2Jun 26, 2007
Semiconductor inspection system
HITACHI LTD43 citations92
US7026830B2Apr 11, 2006
Method and apparatus for inspecting integrated circuit pattern
HITACHI LTD19 citations92
US6667486B2Dec 23, 2003
Electron beam exposure method, electron beam exposure apparatus and device manufacturing method using the same
HITACHI LTD34 citations92
US6559663B2May 6, 2003
Method and apparatus for inspecting integrated circuit pattern
HITACHI LTD20 citations92
US6236057B1May 22, 2001
Method of inspecting pattern and apparatus thereof with a differential brightness image detection
HITACHI LTD15 citations92
US5757409AMay 26, 1998
Exposure method and pattern data preparation system therefor, pattern data preparation method and mask as well as exposure apparatus
HITACHI LTD25 citations92
US5557314ASep 17, 1996
Exposure method and pattern data preparation system therefor, pattern data preparation method and mask as well as exposure apparatus
HITACHI LTD20 citations92
US6249608B1Jun 19, 2001
Template matching image processor utilizing sub image pixel sums and sum of squares thresholding
HITACHI LTD23 citations91
US5043883AAug 27, 1991
Pipe-lined data processor system of synchronous type having memory devices with buffer memory and input/output data control
HITACHI LTD27 citations91
US5250812AOct 5, 1993
Electron beam lithography using an aperture having an array of repeated unit patterns
HITACHI LTD25 citations90
US6828573B1Dec 7, 2004
Electron beam lithography system
HITACHI LTD24 citations89
US6674086B2Jan 6, 2004
Electron beam lithography system, electron beam lithography apparatus, and method of lithography
HITACHI LTD28 citations89
US4532598AJul 30, 1985
Electron beam exposure system
HITACHI LTD43 citations89
US7952074B2May 31, 2011
Method and apparatus for inspecting integrated circuit pattern
HITACHI LTD8 citations84
US4346405AAug 24, 1982
Visual information processing apparatus
HITACHI LTD21 citations81
US7329868B2Feb 12, 2008
Charged particle beam apparatus
HITACHI LTD7 citations74
US6831283B2Dec 14, 2004
Charged particle beam drawing apparatus and pattern forming method
HITACHI LTD7 citations74
US6759666B2Jul 6, 2004
Method and apparatus for charged particle beam exposure
HITACHI LTD8 citations74
US6407808B2Jun 18, 2002
Pattern inspecting system and pattern inspecting method
HITACHI LTD10 citations74
US6376854B2Apr 23, 2002
Method of inspecting a pattern on a substrate
HITACHI LTD8 citations74
US5149975ASep 22, 1992
Pattern fabrication method using a charged particle beam and apparatus for realizing same
HITACHI LTD11 citations74
US4057845ANov 8, 1977
Group control system for visual information processing
HITACHI LTD8 citations73
CANON KK
6 patentsUS7692166B2Apr 6, 2010
Charged particle beam exposure apparatus
CANON KK47 citations94
US6919574B2Jul 19, 2005
Electron beam exposure apparatus, deflection apparatus, and electron beam exposure method
CANON KK35 citations92
US6917045B2Jul 12, 2005
Electron beam exposure apparatus, electron beam exposure apparatus calibration method, and semiconductor element manufacturing method
CANON KK28 citations92
US6870171B2Mar 22, 2005
Exposure apparatus
CANON KK32 citations92
US9063220B2Jun 23, 2015
Object information acquiring apparatus
CANON KK12 citations84
US7105842B2Sep 12, 2006
Method of charged particle beam lithography and equipment for charged particle beam lithography
CANON KK10 citations73
ADVANTEST CORP
2 patentsHITACHI HIGH TECH CORP
1 patentYODA HARUO
1 patentShowing the top 50 of 72 patents by PatentIndex Score.