Inventor
KOIZUMI KATSUYUKI
JP27 patents
⚠️ This page may combine multiple inventors who share the name “KOIZUMI KATSUYUKI”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
TOKYO ELECTRON LTD
20 patentsUS10199246B2Feb 5, 2019
Temperature control mechanism, temperature control method and substrate processing apparatus
TOKYO ELECTRON LTD44 citations93
US11935729B2Mar 19, 2024
Substrate support and plasma processing apparatus
TOKYO ELECTRON LTD2 citations72
US11011347B2May 18, 2021
Plasma processing apparatus
TOKYO ELECTRON LTD3 citations72
US10923369B2Feb 16, 2021
Temperature controlling apparatus, temperature controlling method, and placing table
TOKYO ELECTRON LTD3 citations71
US10679869B2Jun 9, 2020
Placing table and plasma treatment apparatus
TOKYO ELECTRON LTD2 citations71
US11784066B2Oct 10, 2023
Stage and plasma processing apparatus
TOKYO ELECTRON LTD3 citations70
US10515786B2Dec 24, 2019
Mounting table and plasma processing apparatus
TOKYO ELECTRON LTD2 citations70
US11694881B2Jul 4, 2023
Stage and plasma processing apparatus
TOKYO ELECTRON LTD1 citations62
US10886109B2Jan 5, 2021
Stage and plasma processing apparatus
TOKYO ELECTRON LTD1 citations62
US7592261B2Sep 22, 2009
Method for suppressing charging of component in vacuum processing chamber of plasma processing system and plasma processing system
TOKYO ELECTRON LTD2 citations62
US12293903B2May 6, 2025
Substrate support and plasma processing apparatus
TOKYO ELECTRON LTD0 citations61
US11735392B2Aug 22, 2023
Plasma processing apparatus
TOKYO ELECTRON LTD0 citations61
US12354890B2Jul 8, 2025
Stage and plasma processing apparatus
TOKYO ELECTRON LTD0 citations60
US11837480B2Dec 5, 2023
Temperature controlling apparatus, temperature controlling method, and placing table
TOKYO ELECTRON LTD0 citations60
US11373884B2Jun 28, 2022
Placing table and plasma treatment apparatus
TOKYO ELECTRON LTD1 citations60
US11705347B2Jul 18, 2023
Thermal regulator, substrate processing apparatus, and method of controlling temperature of stage
TOKYO ELECTRON LTD0 citations52
US11515194B2Nov 29, 2022
Substrate processing apparatus, substrate processing system, and substrate transporting method
TOKYO ELECTRON LTD0 citations52
US11756806B2Sep 12, 2023
Heater power feeding mechanism
TOKYO ELECTRON LTD0 citations51
US11791177B2Oct 17, 2023
Placing table including heat exchange medium path and substrate processing apparatus thereof
TOKYO ELECTRON LTD0 citations49
US10593522B2Mar 17, 2020
Electrostatic chuck, placing table and plasma processing apparatus
TOKYO ELECTRON LTD0 citations41
SONY CORP
4 patentsUS4891726AJan 2, 1990
Rotary magnetic head and guide drum assembly with reduce mounting height
SONY CORP25 citations92
US6160788ADec 12, 2000
Data recording medium, recording and reproducing system and residual amount display method
SONY CORP19 citations90
US4853804AAug 1, 1989
Magnetic recording and/or reproducing apparatus
SONY CORP10 citations73
US7203147B2Apr 10, 2007
Storage medium initialization method, and recording and reproducing method and apparatus
SONY CORP6 citations60