Inventor
TAKAFUJI ATSUKO
JP37 patents
⚠️ This page may combine multiple inventors who share the name “TAKAFUJI ATSUKO”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
HITACHI LTD
33 patentsUS6583413B1Jun 24, 2003
Method of inspecting a circuit pattern and inspecting instrument
HITACHI LTD123 citations99
US6329826B1Dec 11, 2001
Method and apparatus for inspecting integrated circuit pattern
HITACHI LTD95 citations99
US6172363B1Jan 9, 2001
Method and apparatus for inspecting integrated circuit pattern
HITACHI LTD185 citations99
US6700122B2Mar 2, 2004
Wafer inspection system and wafer inspection process using charged particle beam
HITACHI LTD88 citations97
US6797954B2Sep 28, 2004
Patterned wafer inspection method and apparatus therefor
HITACHI LTD42 citations96
US6476390B1Nov 5, 2002
Method and apparatus for inspecting integrated circuit pattern using a plurality of charged particle beams
HITACHI LTD68 citations96
US6348690B1Feb 19, 2002
Method and an apparatus of an inspection system using an electron beam
HITACHI LTD51 citations96
US6087673AJul 11, 2000
Method of inspecting pattern and apparatus thereof
HITACHI LTD58 citations96
US7098455B2Aug 29, 2006
Method of inspecting a circuit pattern and inspecting instrument
HITACHI LTD26 citations93
US6979823B2Dec 27, 2005
Patterned wafer inspection method and apparatus therefor
HITACHI LTD21 citations93
US7417444B2Aug 26, 2008
Method and apparatus for inspecting integrated circuit pattern
HITACHI LTD25 citations92
US7026830B2Apr 11, 2006
Method and apparatus for inspecting integrated circuit pattern
HITACHI LTD19 citations92
US6825480B1Nov 30, 2004
Charged particle beam apparatus and automatic astigmatism adjustment method
HITACHI LTD38 citations92
US6559663B2May 6, 2003
Method and apparatus for inspecting integrated circuit pattern
HITACHI LTD20 citations92
US6509564B1Jan 21, 2003
Workpiece holder, semiconductor fabricating apparatus, semiconductor inspecting apparatus, circuit pattern inspecting apparatus, charged particle beam application apparatus, calibrating substrate, workpiece holding method, circuit pattern inspecting method, and charged particle beam application method
HITACHI LTD39 citations92
US6452178B2Sep 17, 2002
Method and an apparatus of an inspection system using an electron beam
HITACHI LTD23 citations92
US6236057B1May 22, 2001
Method of inspecting pattern and apparatus thereof with a differential brightness image detection
HITACHI LTD15 citations92
US5490193AFeb 6, 1996
X-ray computed tomography system
HITACHI LTD50 citations92
US7952074B2May 31, 2011
Method and apparatus for inspecting integrated circuit pattern
HITACHI LTD8 citations84
US7397031B2Jul 8, 2008
Method of inspecting a circuit pattern and inspecting instrument
HITACHI LTD10 citations84
US6987265B2Jan 17, 2006
Method and an apparatus of an inspection system using an electron beam
HITACHI LTD9 citations82
US7439506B2Oct 21, 2008
Method and an apparatus of an inspection system using an electron beam
HITACHI LTD3 citations74
US7439504B2Oct 21, 2008
Pattern inspection method and apparatus using electron beam
HITACHI LTD6 citations74
US7242015B2Jul 10, 2007
Patterned wafer inspection method and apparatus therefor
HITACHI LTD6 citations74
US7012252B2Mar 14, 2006
Method and an apparatus of an inspection system using an electron beam
HITACHI LTD5 citations74
US6940069B2Sep 6, 2005
Pattern inspection method and apparatus using electron beam
HITACHI LTD6 citations74
US6768113B2Jul 27, 2004
Workpiece holder, semiconductor fabricating apparatus, semiconductor inspecting apparatus, circuit pattern inspecting apparatus, charged particle beam application apparatus, calibrating substrate, workpiece holding method, circuit pattern inspecting method, and charged particle beam application method
HITACHI LTD7 citations74
US6614022B2Sep 2, 2003
Pattern inspection method and apparatus using electron beam
HITACHI LTD11 citations74
US6512227B2Jan 28, 2003
Method and apparatus for inspecting patterns of a semiconductor device with an electron beam
HITACHI LTD10 citations74
US6376854B2Apr 23, 2002
Method of inspecting a pattern on a substrate
HITACHI LTD8 citations74
US7030394B2Apr 18, 2006
Charged particle beam apparatus and automatic astigmatism adjustment method
HITACHI LTD8 citations73
US7348558B2Mar 25, 2008
Charged particle beam apparatus and automatic astigmatism adjustment method
HITACHI LTD2 citations62
US7232996B2Jun 19, 2007
Method and an apparatus of an inspection system using an electron beam
HITACHI LTD0 citations52