P

Inventor

KUBOTA NAOTAKA

JP37 patents
⚠️ This page may combine multiple inventors who share the name “KUBOTA NAOTAKA”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

TOKYO OHKA KOGYO CO LTD

16 patents
US7323287B2Jan 29, 2008

Positive type resist composition and resist pattern formation method using same

TOKYO OHKA KOGYO CO LTD77 citations99
US7074543B2Jul 11, 2006

Positive resist composition and method of forming resist pattern from the same

TOKYO OHKA KOGYO CO LTD151 citations99
US6406829B1Jun 18, 2002

Negative-working photoresist composition

TOKYO OHKA KOGYO CO LTD44 citations92
US7435530B2Oct 14, 2008

Positive type resist composition and resist pattern formation method using same

TOKYO OHKA KOGYO CO LTD5 citations74
US6455228B1Sep 24, 2002

Multilayered body for photolithographic patterning

TOKYO OHKA KOGYO CO LTD13 citations73
US7316889B2Jan 8, 2008

Positive type resist composition and resist pattern formation method using same

TOKYO OHKA KOGYO CO LTD2 citations63
US7316885B2Jan 8, 2008

Method of forming resist pattern, positive resist composition, and layered product

TOKYO OHKA KOGYO CO LTD6 citations63
US7316888B2Jan 8, 2008

Positive type resist composition and resist pattern formation method using same

TOKYO OHKA KOGYO CO LTD2 citations63
US6416930B2Jul 9, 2002

Composition for lithographic anti-reflection coating, and resist laminate using the same

TOKYO OHKA KOGYO CO LTD4 citations63
US7723007B2May 25, 2010

Polymer compound, photoresist composition including the polymer compound, and resist pattern formation method

TOKYO OHKA KOGYO CO LTD5 citations62
US7501221B2Mar 10, 2009

Positive type resist composition and resist pattern formation method using same

TOKYO OHKA KOGYO CO LTD0 citations52
US7390612B2Jun 24, 2008

Positive type resist composition and resist pattern formation method using same

TOKYO OHKA KOGYO CO LTD0 citations52
US7326515B2Feb 5, 2008

Positive type resist composition and resist pattern formation method using same

TOKYO OHKA KOGYO CO LTD0 citations52
US7129020B2Oct 31, 2006

Liquid coating composition for forming a top antireflective film and photoresist laminate using the same, as well as method for forming photoresist pattern

TOKYO OHKA KOGYO CO LTD1 citations51
US7033731B2Apr 25, 2006

Multilayered body for photolithographic patterning

TOKYO OHKA KOGYO CO LTD0 citations51
US6864036B2Mar 8, 2005

Negative-working photoresist composition

TOKYO OHKA KOGYO CO LTD1 citations51

AISIN SEIKI

9 patents

SEIKO EPSON CORP

8 patents

RENESAS ELECTRONICS CORP

2 patents

IWAI TAKESHI

1 patent

MITSUBISHI ELECTRIC CORP

1 patent