Inventor
JUNG JAEHWANG
KR14 patents
⚠️ This page may combine multiple inventors who share the name “JUNG JAEHWANG”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
SAMSUNG ELECTRONICS CO LTD
13 patentsUS12347096B2Jul 1, 2025
Semiconductor measurement apparatus
SAMSUNG ELECTRONICS CO LTD2 citations73
US12002698B2Jun 4, 2024
Metrology apparatus and method based on diffraction using oblique illumination and method of manufacturing semiconductor device using the metrology method
SAMSUNG ELECTRONICS CO LTD4 citations71
US11972960B2Apr 30, 2024
Imaging ellipsometry (IE)-based inspection method and method of fabricating semiconductor device by using IE-based inspection method
SAMSUNG ELECTRONICS CO LTD3 citations70
US11726046B2Aug 15, 2023
Multi-scale spectral imaging apparatuses and methods, and methods of manufacturing semiconductor devices by using the imaging methods
SAMSUNG ELECTRONICS CO LTD4 citations70
US12228499B2Feb 18, 2025
Pupil ellipsometry measurement apparatus and method and method of fabricating semiconductor device using the pupil ellipsometry measurement method
SAMSUNG ELECTRONICS CO LTD0 citations60
US11604136B2Mar 14, 2023
Pupil ellipsometry measurement apparatus and method and method of fabricating semiconductor device using the pupil ellipsometry measurement method
SAMSUNG ELECTRONICS CO LTD0 citations60
US11428947B2Aug 30, 2022
Super-resolution holographic microscope
SAMSUNG ELECTRONICS CO LTD0 citations49
US11275034B2Mar 15, 2022
Inspection apparatus and method based on coherent diffraction imaging (CDI)
SAMSUNG ELECTRONICS CO LTD0 citations49
US11264256B2Mar 1, 2022
Wafer inspection apparatus
SAMSUNG ELECTRONICS CO LTD0 citations48
US12313393B2May 27, 2025
Level sensor and substrate processing apparatus including the same
SAMSUNG ELECTRONICS CO LTD0 citations47
US12222282B2Feb 11, 2025
Semiconductor measurement apparatus
SAMSUNG ELECTRONICS CO LTD0 citations47
US11624699B2Apr 11, 2023
Measurement system capable of adjusting AOI, AOI spread and azimuth of incident light
SAMSUNG ELECTRONICS CO LTD0 citations45
US12561788B2Feb 24, 2026
Fluorescence microscopy metrology system and method of operating fluorescence microscopy metrology system
SAMSUNG ELECTRONICS CO LTD0 citations41