Inventor

JUNG MIN HO

KR102 patents

⚠️ This page may combine multiple inventors who share the name “JUNG MIN HO”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

JUNG MIN HO

HYUNDAI ELECTRONICS IND

Partially crosslinked polymer for bilayer photoresist

Partially crosslinked polymer for bilayer photoresist

Polymer and a forming method of a micro pattern using the same

Polymer and a forming method of a micro pattern using the same

Oxabicyclo compound, a polymer-containing said compound, and a photoresist micro pattern forming method using the same

Polymer-containing photoresist, and process for manufacturing the same

Organic anti-reflective coating polymer and preparation thereof

Photoresist monomer having hydroxy group and carboxy group, copolymer thereof and photoresist composition using the same

Copolymer resin, preparation thereof, and photoresist using the same

Semiconductor device using polymer-containing photoresist, and process for manufacturing the same

Photoresist polymers of carboxyl-containing alicyclic compounds

Photoresist monomers, polymers thereof, and photoresist compositions containing the same

Photoresist monomers, polymers thereof, and photoresist compositions containing the same

Organic anti-reflective coating polymer and preparation thereof

Organic anti-reflective polymer and method for manufacturing thereof

Organic anti-reflective coating material and its preparation

Anti reflective coating polymers and the preparation method thereof

Organic anti-reflective coating material and its preparation

N-vinyllactam derivatives and polymer thereof

Copolymers containing N-vinyllactam derivatives, preparation methods thereof and photoresists therefrom

Anti reflective coating polymers and the preparation method thereof

Photoresist monomer, polymer thereof and photoresist composition containing it

Polymers and photoresist compositions using the same

Monomers for photoresist, polymers thereof, and photoresist compositions using the same

Organic anti-reflective coating polymer and preparation thereof

Organic anti-reflective polymer and method for manufacturing thereof

Cross-linker for photoresist, and process for forming a photoresist pattern using the same

Photoresist monomer, polymer thereof and photoresist composition containing it

Thiabicyclo compound, a polymer-containing said compound, and a photoresist micro pattern forming method using the same

Phenylenediamine derivative-type additive useful for a chemically amplified photoresist

Photoresist monomers, polymers thereof, and photoresist compositions containing the same

Copolymer resin, preparation thereof, and photoresist using the same

Copolymer resin, preparation thereof, and photoresist using the same

Photoresist cross-linking monomers, photoresist polymers and photoresist compositions comprising the same

Monomer and polymer for photoresist, and photoresist using the same

N-vinyllactam derivatives and polymer thereof

HYNIX SEMICONDUCTOR INC

Photoresist composition containing photo radical generator with photoacid generator

Organic anti-reflective coating material and preparation thereof

Partially crosslinked polymer for bilayer photoresist

Top-coating composition for photoresist and process for forming fine pattern using the same

Photoresist composition for resist flow process

Photoresist monomer, polymer thereof and photoresist composition containing the same

Organic anti-reflective coating polymer, anti-reflective coating composition methods of preparation thereof

SAMSUNG ELECTRONICS CO LTD

Door and clothes treating apparatus having the same

Dishwasher and method for controlling same

Dishwasher and controlling method thereof

Dish washing machine

Dishwasher and method for controlling same

HWANG JONG-TAE

Switch controller, switch control method, and converter using the same

CHO GYE-HYUN

Control device, LED light emitting device including the same, and control method