Inventor
NAKASHIMA MUTSUO
JP70 patents
⚠️ This page may combine multiple inventors who share the name “NAKASHIMA MUTSUO”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
SHINETSU CHEMICAL CO
49 patentsUS6448420B1Sep 10, 2002
Acid-decomposable ester compound suitable for use in resist material
SHINETSU CHEMICAL CO160 citations99
US6312867B1Nov 6, 2001
Ester compounds, polymers, resist compositions and patterning process
SHINETSU CHEMICAL CO209 citations99
US5972560AOct 26, 1999
High molecular weight silicone compound, chemically amplified positive resist composition and patterning method
SHINETSU CHEMICAL CO94 citations98
US6309796B1Oct 30, 2001
High molecular weight silicone compounds resist compositions, and patterning method
SHINETSU CHEMICAL CO63 citations96
US6147249ANov 14, 2000
Ester compounds, polymers, resist composition and patterning process
SHINETSU CHEMICAL CO81 citations96
US6730453B2May 4, 2004
High molecular weight silicone compounds, resist compositions, and patterning method
SHINETSU CHEMICAL CO42 citations93
US6673515B2Jan 6, 2004
Polymer, resist composition and patterning process
SHINETSU CHEMICAL CO20 citations93
US6512067B2Jan 28, 2003
Polymer, resist composition and patterning process
SHINETSU CHEMICAL CO23 citations93
US6492090B2Dec 10, 2002
Polymers, resist compositions and patterning process
SHINETSU CHEMICAL CO25 citations93
US6444396B1Sep 3, 2002
Ester compounds, polymers, resist composition and patterning process
SHINETSU CHEMICAL CO24 citations93
US6284429B1Sep 4, 2001
Ester compounds, polymers, resist compositions and patterning process
SHINETSU CHEMICAL CO50 citations93
US8026038B2Sep 27, 2011
Metal oxide-containing film-forming composition, metal oxide-containing film, metal oxide-containing film-bearing substrate, and patterning method
SHINETSU CHEMICAL CO19 citations84
US7651829B2Jan 26, 2010
Positive resist material and pattern formation method using the same
SHINETSU CHEMICAL CO9 citations84
US6566038B2May 20, 2003
Polymers, resist compositions and patterning process
SHINETSU CHEMICAL CO13 citations84
US6492089B2Dec 10, 2002
Polymer, resist composition and patterning process
SHINETSU CHEMICAL CO14 citations84
US6461791B1Oct 8, 2002
Polymers, chemical amplification resist compositions and patterning process
SHINETSU CHEMICAL CO20 citations84
US6413695B1Jul 2, 2002
Resist compositions and patterning process
SHINETSU CHEMICAL CO18 citations84
US6962767B2Nov 8, 2005
Acetal compound, polymer, resist composition and patterning process
SHINETSU CHEMICAL CO10 citations74
US6596463B2Jul 22, 2003
Ester compounds, polymers, resist compositions and patterning process
SHINETSU CHEMICAL CO8 citations74
US6586157B2Jul 1, 2003
Ester compounds, polymers, resist compositions and patterning process
SHINETSU CHEMICAL CO12 citations74
US6515150B2Feb 4, 2003
Cyclic acetal compound, polymer, resist composition and patterning process
SHINETSU CHEMICAL CO5 citations74
US6472543B2Oct 29, 2002
Lactone compounds having alicyclic structure and their manufacturing method
SHINETSU CHEMICAL CO7 citations74
US6403823B2Jun 11, 2002
Ester compounds having alicyclic structure and method for preparing same
SHINETSU CHEMICAL CO9 citations74
US6369279B1Apr 9, 2002
Styrene derivatives
SHINETSU CHEMICAL CO12 citations74
US5641431AJun 24, 1997
Silacyclohexanone compound and a method of preparing a silacyclohexane-type liquid crystal composition containing it
SHINETSU CHEMICAL CO6 citations74
US5582764ADec 10, 1996
Silacyclohexane compound, a method of preparing it and a liquid crystal composition containing it
SHINETSU CHEMICAL CO17 citations74
US5578244ANov 26, 1996
Silacyclohexane compound, a method of preparing it and a liquid crystal composition containing it
SHINETSU CHEMICAL CO7 citations74
US5560866AOct 1, 1996
Process for preparing silacyclohexane compounds
SHINETSU CHEMICAL CO7 citations74
US5527490AJun 18, 1996
Silacyclohexane carbaldehyde compounds and processes for preparing silacyclohexane-based liquid crystal compounds from the carbaldehyde compound
SHINETSU CHEMICAL CO8 citations74
US5523440AJun 4, 1996
Silacyclohexane compound, a method of preparaing it and a liquid crystal composition containing it
SHINETSU CHEMICAL CO7 citations74
US7745094B2Jun 29, 2010
Resist composition and patterning process using the same
SHINETSU CHEMICAL CO4 citations63
US7265234B2Sep 4, 2007
Silsesquioxane compound mixture, method of making, resist composition, and patterning process
SHINETSU CHEMICAL CO4 citations63
US6835525B2Dec 28, 2004
Polymer, resist composition and patterning process
SHINETSU CHEMICAL CO4 citations63
US6780563B2Aug 24, 2004
Polymer, resist composition and patterning process
SHINETSU CHEMICAL CO3 citations63
US6677101B2Jan 13, 2004
Polymers, resist materials, and pattern formation method
SHINETSU CHEMICAL CO3 citations63
US6670094B2Dec 30, 2003
Polymer, resist composition and patterning process
SHINETSU CHEMICAL CO5 citations63
US6670498B2Dec 30, 2003
Ester compounds, polymers, resist compositions and patterning process
SHINETSU CHEMICAL CO2 citations63
US6660448B2Dec 9, 2003
Polymer, resist composition and patterning process
SHINETSU CHEMICAL CO4 citations63
US6624335B2Sep 23, 2003
Ether, polymer, resist composition and patterning process
SHINETSU CHEMICAL CO4 citations63
US6531627B2Mar 11, 2003
Ester compounds, polymers, resist compositions and patterning process
SHINETSU CHEMICAL CO4 citations63
US6515149B2Feb 4, 2003
Acetal compound, polymer, resist composition and patterning response
SHINETSU CHEMICAL CO3 citations63
US6500961B2Dec 31, 2002
Lactone compounds having alicyclic structure and their manufacturing method
SHINETSU CHEMICAL CO6 citations63
US6461790B1Oct 8, 2002
Polymers, chemical amplification resist compositions and patterning process
SHINETSU CHEMICAL CO5 citations63
US6403822B2Jun 11, 2002
Ester compounds having alicyclic structure and method for preparing same
SHINETSU CHEMICAL CO5 citations63
US6004478ADec 21, 1999
Silacyclohexane compounds, preparation thereof, liquid crystal compositions comprising the same, and liquid crystal devices comprising the composition
SHINETSU CHEMICAL CO2 citations63
US5951913ASep 14, 1999
Liquid crystal compositions comprising silacyclohexane compounds
SHINETSU CHEMICAL CO2 citations63
US5762826AJun 9, 1998
Liquid crystal composition and a liquid crystal display element which contains it
SHINETSU CHEMICAL CO6 citations63
US5730902AMar 24, 1998
Optically active silacyclohexane compounds, liquid crystal compositions comprising the same and liquid crystal display devices comprising the compositions
SHINETSU CHEMICAL CO2 citations63
US5679746AOct 21, 1997
Silacyclohexane compound, a method of preparing it and a liquid crystal composition containing it
SHINETSU CHEMICAL CO6 citations63
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