Inventor

NOHARA SHINGO

JP14 patents

⚠️ This page may combine multiple inventors who share the name “NOHARA SHINGO”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

HITACHI INT ELECTRIC INC

10 patents

US9865451B2Jan 9, 2018

Cleaning method, method of manufacturing semiconductor device, substrate processing apparatus, and recording medium

HITACHI INT ELECTRIC INC8 citations84

US9349586B2May 24, 2016

Method of manufacturing semiconductor device, substrate processing apparatus, substrate processing system and non-transitory computer-readable recording medium

HITACHI INT ELECTRIC INC8 citations84

US9620357B2Apr 11, 2017

Method of manufacturing semiconductor device, substrate processing apparatus, and recording medium

HITACHI INT ELECTRIC INC8 citations83

US10032626B2Jul 24, 2018

Method of manufacturing semiconductor device by forming a film on a substrate, substrate processing apparatus, and recording medium

HITACHI INT ELECTRIC INC9 citations82

US9793107B2Oct 17, 2017

Method of manufacturing semiconductor device, substrate processing apparatus, and recording medium

HITACHI INT ELECTRIC INC4 citations73

US9698007B2Jul 4, 2017

Method of manufacturing semiconductor device, substrate processing apparatus, and recording medium

HITACHI INT ELECTRIC INC3 citations73

US12040179B2Jul 16, 2024

Method of manufacturing semiconductor device, substrate processing apparatus, and recording medium

HITACHI INT ELECTRIC INC0 citations60

US9831082B2Nov 28, 2017

Method of manufacturing semiconductor device, substrate processing apparatus, substrate processing system and non-transitory computer-readable recording medium

HITACHI INT ELECTRIC INC1 citations52

US9673043B2Jun 6, 2017

Method of manufacturing semiconductor device, substrate processing apparatus, substrate processing system and recording medium

HITACHI INT ELECTRIC INC1 citations52

US9881789B2Jan 30, 2018

Method of manufacturing semiconductor device, substrate processing apparatus, and recording medium

HITACHI INT ELECTRIC INC1 citations51

KOKUSAI ELECTRIC CORP

4 patents

US12467689B2Nov 11, 2025

Furnace opening structure, substrate processing apparatus and method of manufacturing semiconductor device

KOKUSAI ELECTRIC CORP0 citations62

US12195848B2Jan 14, 2025

Method of cleaning, method of manufacturing semiconductor device, substrate processing apparatus, and recording medium

KOKUSAI ELECTRIC CORP0 citations61

US11618947B2Apr 4, 2023

Method of cleaning, method of manufacturing semiconductor device, substrate processing apparatus, and recording medium

KOKUSAI ELECTRIC CORP0 citations61

US12494363B2Dec 9, 2025

Method of processing substrate, method of manufacturing semiconductor device, recording medium, and substrate processing apparatus

KOKUSAI ELECTRIC CORP0 citations49