Inventor
ONKELS ECKEHARD D
US20 patents
Patents
20 patentsUS6567450B2May 20, 2003
Very narrow band, two chamber, high rep rate gas discharge laser system
CYMER INC265 citations99
US6625191B2Sep 23, 2003
Very narrow band, two chamber, high rep rate gas discharge laser system
CYMER INC236 citations98
US6381257B1Apr 30, 2002
Very narrow band injection seeded F2 lithography laser
CYMER INC106 citations98
US6370174B1Apr 9, 2002
Injection seeded F2 lithography laser
CYMER INC99 citations98
US6359922B1Mar 19, 2002
Single chamber gas discharge laser with line narrowed seed beam
CYMER INC102 citations97
US6317447B1Nov 13, 2001
Electric discharge laser with acoustic chirp correction
CYMER INC108 citations97
US6590922B2Jul 8, 2003
Injection seeded F2 laser with line selection and discrimination
CYMER INC63 citations95
US6466602B1Oct 15, 2002
Gas discharge laser long life electrodes
CYMER INC69 citations94
US7567607B2Jul 28, 2009
Very narrow band, two chamber, high rep-rate gas discharge laser system
CYMER INC14 citations92
US6985508B2Jan 10, 2006
Very narrow band, two chamber, high reprate gas discharge laser system
CYMER INC29 citations92
US6801560B2Oct 5, 2004
Line selected F2 two chamber laser system
CYMER INC18 citations92
US6560263B1May 6, 2003
Discharge laser having electrodes with sputter cavities and discharge peaks
CYMER INC35 citations92
US6556600B2Apr 29, 2003
Injection seeded F2 laser with centerline wavelength control
CYMER INC27 citations92
US6765945B2Jul 20, 2004
Injection seeded F2 laser with pre-injection filter
CYMER INC16 citations84
US7058107B2Jun 6, 2006
Line selected F2 two chamber laser system
CYMER INC5 citations74
US6330260B1Dec 11, 2001
F2 laser with visible red and IR control
CYMER INC12 citations74
US7061961B2Jun 13, 2006
Very narrow band, two chamber, high rep-rate gas discharge laser system
CYMER INC5 citations73
US7218661B2May 15, 2007
Line selected F2 two chamber laser system
CYMER INC4 citations62
US6735236B2May 11, 2004
High power gas discharge laser with line narrowing unit
CYMER INC5 citations60
US6539042B2Mar 25, 2003
Ultra pure component purge system for gas discharge laser
CYMER INC0 citations51