Inventor
BROWN DUNCAN W
US22 patents
⚠️ This page may combine multiple inventors who share the name “BROWN DUNCAN W”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
ADVANCED TECH MATERIALS
20 patentsUS6533874B1Mar 18, 2003
GaN-based devices using thick (Ga, Al, In)N base layers
ADVANCED TECH MATERIALS232 citations99
US6156581ADec 5, 2000
GaN-based devices using (Ga, AL, In)N base layers
ADVANCED TECH MATERIALS507 citations99
US5919522AJul 6, 1999
Growth of BaSrTiO3 using polyamine-based precursors
ADVANCED TECH MATERIALS149 citations99
US5453494ASep 26, 1995
Metal complex source reagents for MOCVD
ADVANCED TECH MATERIALS276 citations99
US5280012AJan 18, 1994
Method of forming a superconducting oxide layer by MOCVD
ADVANCED TECH MATERIALS152 citations99
US5225561AJul 6, 1993
Source reagent compounds for MOCVD of refractory films containing group IIA elements
ADVANCED TECH MATERIALS181 citations99
US5840897ANov 24, 1998
Metal complex source reagents for chemical vapor deposition
ADVANCED TECH MATERIALS275 citations98
US4853148AAug 1, 1989
Process and composition for drying of gaseous hydrogen halides
ADVANCED TECH MATERIALS60 citations96
US4761395AAug 2, 1988
Process and composition for purifying arsine, phosphine, ammonia, and inert gases to remove Lewis acid and oxidant impurities therefrom
ADVANCED TECH MATERIALS72 citations96
US6126996AOct 3, 2000
Metal complex source reagents for chemical vapor deposition
ADVANCED TECH MATERIALS87 citations95
US5051785ASep 24, 1991
N-type semiconducting diamond, and method of making the same
ADVANCED TECH MATERIALS52 citations94
US6027547AFeb 22, 2000
Fluid storage and dispensing vessel with modified high surface area solid as fluid storage medium
ADVANCED TECH MATERIALS39 citations93
US5015411AMay 14, 1991
Process, composition, and apparatus for purifying inert gases to remove Lewis acid and oxidant impurities therefrom
ADVANCED TECH MATERIALS35 citations93
US4925646AMay 15, 1990
Process and composition for drying of gaseous hydrogen halides
ADVANCED TECH MATERIALS46 citations93
US5312983AMay 17, 1994
Organometallic tellurium compounds useful in chemical vapor deposition processes
ADVANCED TECH MATERIALS32 citations88
US4983363AJan 8, 1991
Apparatus for purifying arsine, phosphine, ammonia, and inert gases to remove Lewis acid and oxidant impurities therefrom
ADVANCED TECH MATERIALS21 citations82
US4950419AAug 21, 1990
Process, composition, and apparatus for purifying inert gases to remove lewis acid and oxidant impurities therefrom
ADVANCED TECH MATERIALS15 citations74
US4865822ASep 12, 1989
Process for purifying hydrogen selenide and hydrogen telluride, to remove moisture and oxidant impurities therefrom
ADVANCED TECH MATERIALS7 citations74
US4797227AJan 10, 1989
Process and composition for purifying hydrogen selenide and hydrogen telluride, to remove moisture and oxidant impurities therefrom
ADVANCED TECH MATERIALS11 citations74
US4781900ANov 1, 1988
Process and composition for purifying arsine, phosphine, ammonia, and inert gases to remove Lewis acid and oxidant impurities therefrom
ADVANCED TECH MATERIALS14 citations74